{"paper":{"title":"Field induced nucleation in nano-structures","license":"http://arxiv.org/licenses/nonexclusive-distrib/1.0/","headline":"","cross_cats":[],"primary_cat":"cond-mat.mes-hall","authors_text":"Dipesh Niraula, V.G. Karpov","submitted_at":"2018-04-11T00:05:01Z","abstract_excerpt":"We predict the probability of field induced nucleation (FIN) of conductive filaments across the nano-thin dielectric layers in memory and switching devices. The novelty of our analysis is that it deals with a dielectric layer of thickness below the critical nucleation length. We show how the latter constraint can make FIN a truly threshold phenomenon possible only for voltage (not the field) exceeding a certain critical value that does not depend on the dielectric thickness. Our analysis predicts the possibility of threshold switching without memory under certain thickness dependent voltages. "},"claims":{"count":0,"items":[],"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"source":{"id":"1804.03754","kind":"arxiv","version":1},"verdict":{"id":null,"model_set":{},"created_at":null,"strongest_claim":"","one_line_summary":"","pipeline_version":null,"weakest_assumption":"","pith_extraction_headline":""},"references":{"count":0,"sample":[],"resolved_work":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57","internal_anchors":0},"formal_canon":{"evidence_count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"author_claims":{"count":0,"strong_count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"builder_version":"pith-number-builder-2026-05-17-v1"}