{"paper":{"title":"Microfabrication of large area high-stress silicon nitride membranes for optomechanical devices","license":"http://arxiv.org/licenses/nonexclusive-distrib/1.0/","headline":"","cross_cats":[],"primary_cat":"quant-ph","authors_text":"A. Borrielli, A. Pontin, B. Morana, D. Vitali, E. Serra, F. Marin, F. Marino, G.A. Prodi, G. Di Giuseppe, G. Pandraud, L. Marconi, M. Bawaj, M. Bonaldi, M. Rossi, N. Kralj, N. Malossi, P.M. Sarro, R. Natali, S. Forte","submitted_at":"2015-12-21T16:59:48Z","abstract_excerpt":"In view of the integration of membrane resonators with more complex MEMS structures, we developed a general fabrication procedure for circular shape SiN$_x$ membranes using Deep Reactive Ion Etching (DRIE). Large area and high-stress SiN$_x$ membranes were fabricated and used as optomechanical resonators in a Michelson interferometer and in a Fabry-P\\'erot cavity. The measurements show that the fabrication process preserves both the optical quality and the mechanical quality factor of the membrane."},"claims":{"count":0,"items":[],"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"source":{"id":"1601.02669","kind":"arxiv","version":1},"verdict":{"id":null,"model_set":{},"created_at":null,"strongest_claim":"","one_line_summary":"","pipeline_version":null,"weakest_assumption":"","pith_extraction_headline":""},"references":{"count":0,"sample":[],"resolved_work":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57","internal_anchors":0},"formal_canon":{"evidence_count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"author_claims":{"count":0,"strong_count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"builder_version":"pith-number-builder-2026-05-17-v1"}