{"paper":{"title":"Performance Analysis of Strained Monolayer MoS$_{2}$ MOSFET","license":"http://arxiv.org/licenses/nonexclusive-distrib/1.0/","headline":"","cross_cats":[],"primary_cat":"cond-mat.mes-hall","authors_text":"Amretashis Sengupta, Ram Krishna Ghosh, Santanu Mahapatra","submitted_at":"2013-07-04T12:30:50Z","abstract_excerpt":"We present a computational study on the impact of tensile/compressive uniaxial ($\\varepsilon_{xx}$) and biaxial ($\\varepsilon_{xx}=\\varepsilon_{yy}$) strain on monolayer MoS$_{2}$ NMOS and PMOS FETs. The material properties like band structure, carrier effective mass and the multi-band Hamiltonian of the channel, are evaluated using the Density Functional Theory (DFT). Using these parameters, self-consistent Poisson-Schr\\\"{o}dinger solution under the Non-Equilibrium Green's Function (NEGF) formalism is carried out to simulate the MOS device characteristics. 1.75$%$ uniaxial tensile strain is f"},"claims":{"count":0,"items":[],"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"source":{"id":"1307.1300","kind":"arxiv","version":2},"verdict":{"id":null,"model_set":{},"created_at":null,"strongest_claim":"","one_line_summary":"","pipeline_version":null,"weakest_assumption":"","pith_extraction_headline":""},"references":{"count":0,"sample":[],"resolved_work":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57","internal_anchors":0},"formal_canon":{"evidence_count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"author_claims":{"count":0,"strong_count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"builder_version":"pith-number-builder-2026-05-17-v1"}