{"record_type":"pith_number_record","schema_url":"https://pith.science/schemas/pith-number/v1.json","pith_number":"pith:2019:CM3S6VJDRX4NDRE4Q2QMTRVR4Q","short_pith_number":"pith:CM3S6VJD","schema_version":"1.0","canonical_sha256":"13372f55238df8d1c49c86a0c9c6b1e40b16e2f5dc7cec9747286e5f2e3a3b2d","source":{"kind":"arxiv","id":"1902.08018","version":1},"attestation_state":"computed","paper":{"title":"GPU Acceleration of Real-Time Control Loops","license":"http://arxiv.org/licenses/nonexclusive-distrib/1.0/","headline":"","cross_cats":["cs.SY"],"primary_cat":"cs.DC","authors_text":"Alejandro Arrizabalaga, Frank Overman, Jean-Paul Smeets, John Wagensveld, Kornel van der Sommen, Mohamed A. Bamakhrama, Remko van der Vossen","submitted_at":"2019-02-21T13:07:13Z","abstract_excerpt":"Extreme Ultraviolet (EUV) photolithography is seen as the key enabler for increasing transistor density in the next decade. In EUV lithography, 13.5 nm EUV light is illuminated through a reticle, holding a pattern to be printed, onto a silicon wafer. This process is performed about 100 times per wafer, at a rate of over a hundred wafers an hour. During this process, a certain percentage of the light energy is converted into heat in the wafer. In turn, this heat causes the wafer to deform which increases the overlay error, and as a result, reduces the manufacturing yield. To alleviate this, we "},"verification_status":{"content_addressed":true,"pith_receipt":true,"author_attested":false,"weak_author_claims":0,"strong_author_claims":0,"externally_anchored":false,"storage_verified":false,"citation_signatures":0,"replication_records":0,"graph_snapshot":true,"references_resolved":false,"formal_links_present":false},"canonical_record":{"source":{"id":"1902.08018","kind":"arxiv","version":1},"metadata":{"license":"http://arxiv.org/licenses/nonexclusive-distrib/1.0/","primary_cat":"cs.DC","submitted_at":"2019-02-21T13:07:13Z","cross_cats_sorted":["cs.SY"],"title_canon_sha256":"799063b60566d12f17a4709fe4feb09ef6f0bbd7b37e6f728aa7832ff3c43c0b","abstract_canon_sha256":"f925da96f86a5b2cb5de96e8528b790b19de7bf100f09cc6abb10f23e862c75e"},"schema_version":"1.0"},"receipt":{"kind":"pith_receipt","key_id":"pith-v1-2026-05","algorithm":"ed25519","signed_at":"2026-05-17T23:53:02.406497Z","signature_b64":"J9doqViIj6S/WruZph9O9rlBs3iCOMc3WGq1DN9ifxhdBaV0/njka4G6FNurXXkpCjxPLkMIeJK1SMm15K9fAg==","signed_message":"canonical_sha256_bytes","builder_version":"pith-number-builder-2026-05-17-v1","receipt_version":"0.3","canonical_sha256":"13372f55238df8d1c49c86a0c9c6b1e40b16e2f5dc7cec9747286e5f2e3a3b2d","last_reissued_at":"2026-05-17T23:53:02.405886Z","signature_status":"signed_v1","first_computed_at":"2026-05-17T23:53:02.405886Z","public_key_fingerprint":"8d4b5ee74e4693bcd1df2446408b0d54"},"graph_snapshot":{"paper":{"title":"GPU Acceleration of Real-Time Control Loops","license":"http://arxiv.org/licenses/nonexclusive-distrib/1.0/","headline":"","cross_cats":["cs.SY"],"primary_cat":"cs.DC","authors_text":"Alejandro Arrizabalaga, Frank Overman, Jean-Paul Smeets, John Wagensveld, Kornel van der Sommen, Mohamed A. Bamakhrama, Remko van der Vossen","submitted_at":"2019-02-21T13:07:13Z","abstract_excerpt":"Extreme Ultraviolet (EUV) photolithography is seen as the key enabler for increasing transistor density in the next decade. In EUV lithography, 13.5 nm EUV light is illuminated through a reticle, holding a pattern to be printed, onto a silicon wafer. This process is performed about 100 times per wafer, at a rate of over a hundred wafers an hour. During this process, a certain percentage of the light energy is converted into heat in the wafer. In turn, this heat causes the wafer to deform which increases the overlay error, and as a result, reduces the manufacturing yield. To alleviate this, we "},"claims":{"count":0,"items":[],"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"source":{"id":"1902.08018","kind":"arxiv","version":1},"verdict":{"id":null,"model_set":{},"created_at":null,"strongest_claim":"","one_line_summary":"","pipeline_version":null,"weakest_assumption":"","pith_extraction_headline":""},"references":{"count":0,"sample":[],"resolved_work":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57","internal_anchors":0},"formal_canon":{"evidence_count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"author_claims":{"count":0,"strong_count":0,"snapshot_sha256":"258153158e38e3291e3d48162225fcdb2d5a3ed65a07baac614ab91432fd4f57"},"builder_version":"pith-number-builder-2026-05-17-v1"},"aliases":[{"alias_kind":"arxiv","alias_value":"1902.08018","created_at":"2026-05-17T23:53:02.406004+00:00"},{"alias_kind":"arxiv_version","alias_value":"1902.08018v1","created_at":"2026-05-17T23:53:02.406004+00:00"},{"alias_kind":"doi","alias_value":"10.48550/arxiv.1902.08018","created_at":"2026-05-17T23:53:02.406004+00:00"},{"alias_kind":"pith_short_12","alias_value":"CM3S6VJDRX4N","created_at":"2026-05-18T12:33:15.570797+00:00"},{"alias_kind":"pith_short_16","alias_value":"CM3S6VJDRX4NDRE4","created_at":"2026-05-18T12:33:15.570797+00:00"},{"alias_kind":"pith_short_8","alias_value":"CM3S6VJD","created_at":"2026-05-18T12:33:15.570797+00:00"}],"events":[],"event_summary":{},"paper_claims":[],"inbound_citations":{"count":0,"internal_anchor_count":0,"sample":[]},"formal_canon":{"evidence_count":0,"sample":[],"anchors":[]},"links":{"html":"https://pith.science/pith/CM3S6VJDRX4NDRE4Q2QMTRVR4Q","json":"https://pith.science/pith/CM3S6VJDRX4NDRE4Q2QMTRVR4Q.json","graph_json":"https://pith.science/api/pith-number/CM3S6VJDRX4NDRE4Q2QMTRVR4Q/graph.json","events_json":"https://pith.science/api/pith-number/CM3S6VJDRX4NDRE4Q2QMTRVR4Q/events.json","paper":"https://pith.science/paper/CM3S6VJD"},"agent_actions":{"view_html":"https://pith.science/pith/CM3S6VJDRX4NDRE4Q2QMTRVR4Q","download_json":"https://pith.science/pith/CM3S6VJDRX4NDRE4Q2QMTRVR4Q.json","view_paper":"https://pith.science/paper/CM3S6VJD","resolve_alias":"https://pith.science/api/pith-number/resolve?arxiv=1902.08018&json=true","fetch_graph":"https://pith.science/api/pith-number/CM3S6VJDRX4NDRE4Q2QMTRVR4Q/graph.json","fetch_events":"https://pith.science/api/pith-number/CM3S6VJDRX4NDRE4Q2QMTRVR4Q/events.json","actions":{"anchor_timestamp":"https://pith.science/pith/CM3S6VJDRX4NDRE4Q2QMTRVR4Q/action/timestamp_anchor","attest_storage":"https://pith.science/pith/CM3S6VJDRX4NDRE4Q2QMTRVR4Q/action/storage_attestation","attest_author":"https://pith.science/pith/CM3S6VJDRX4NDRE4Q2QMTRVR4Q/action/author_attestation","sign_citation":"https://pith.science/pith/CM3S6VJDRX4NDRE4Q2QMTRVR4Q/action/citation_signature","submit_replication":"https://pith.science/pith/CM3S6VJDRX4NDRE4Q2QMTRVR4Q/action/replication_record"}},"created_at":"2026-05-17T23:53:02.406004+00:00","updated_at":"2026-05-17T23:53:02.406004+00:00"}