A differentiable, physics-based photoresist simulator with about twenty parameters beats threshold-based baselines on LithoBench while enabling gradient-based co-optimization.
Iccad-2013 cad contest in mask optimization and benchmark suite,
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TorchResist: Open-Source Differentiable Resist Simulator
A differentiable, physics-based photoresist simulator with about twenty parameters beats threshold-based baselines on LithoBench while enabling gradient-based co-optimization.