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Magnetoelectric Response of Antiferromagnetic Van der Waals Bilayers

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arxiv 1902.06418 v3 pith:6ZWQITJ2 submitted 2019-02-18 cond-mat.mes-hall

classification cond-mat.mes-hall
keywords bilayerswaalsantiferromagneticgeometriesinteractionsmagneticmagnetoelectricresponse
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abstract

We predict that antiferromagnetic bilayers formed from van der Waals (vdW) materials, like bilayer CrI$_3$, have a strong magnetoelectric response that can be detected by measuring the gate voltage dependence of Faraday or Kerr rotation signals, total magnetization, or anomalous Hall conductivity. Strong effects are possible in single-gate geometries, and in dual-gate geometries that allow internal electric fields and total carrier densities to be varied independently. We comment on the reliability of density-functional-theory estimates of interlayer magnetic interactions in van der Waals bilayers, and on the sensitivity of magnetic interactions to pressure that alters the spatial separation between layers.

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Cited by 1 Pith paper

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  1. Low-temperature monoclinic layer stacking in atomically thin CrI$_3$ crystals

    cond-mat.mes-hall 2019-08 conditional novelty 5.0 of 10

    Polarization-resolved Raman spectroscopy shows that atomically thin CrI3 remains in the monoclinic stacking phase at low temperature, unlike bulk CrI3, explaining the antiferromagnetic order in thin multilayers.

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