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Paper Citation Record · LEDGER

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds

As of 18 August 2026, this Paper Citation Record lists 26 of 26 outbound references and 0 inbound Pith citation observations for arXiv:2608.03078.

A citation records a reference. It does not transfer a finding from one paper to another.

pith.paper-citation-record.v1
2608.03078 v1

Coverage vector

measured 26 of 26 reference resolution

Typed states for the displayed outbound observations.

Source: paper_references, paper_reference_links, observed 2026-08-15T14:55:21.775788Z

measured 26 of 26 standing notices

One-hop event checks from named stored sources.

Source: scholarly_work_events, retraction_status_cache, observed 2026-08-18T06:34:40.430872+00:00

measured 0 of 0 inbound itemization

Pith citing papers itemized under the disclosed page cap.

Source: paper_references, paper_reference_links

measured 0 of 1 external citation measurements

A source-named dated measurement, never combined with another source.

Source: cited_works

Reference resolution

26 of 26 outbound references displayed

  • verified exact0
  • verified fuzzy21
  • unresolved5
  • parse uncertain0
  • malformed identifier0
  • metadata mismatch0

External citation measurements

No source-named external measurement is stored.

Outbound references

Observation 3b671c50-aa8c-461b-9c10-7eea14552e23 · outbound

This paper cites International Journal of Fuzzy Logic and Intelligent Systems , volume =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds International Journal of Fuzzy Logic and Intelligent Systems , volume =

Reference 1

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:22.173258Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-18T06:34:40.430872+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.657535Z digest=sha256:e10b0de62215d1c3e7044f2d440f9b6fa59eb9abd21aef70de7eed2cdbf9e74e

Observation 13f2eae1-9ec5-456f-b538-62102eaf07a9 · outbound

This paper cites 2017 30th IEEE International System-on-Chip Conference (SOCC) , pages =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds 2017 30th IEEE International System-on-Chip Conference (SOCC) , pages =

Reference 2

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:22.159572Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-18T06:34:40.430872+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.662856Z digest=sha256:a9e99370998c7cd528ad15f9200f6bb5128580912d4d355fdc95633678009f68

Observation ed9e21e8-77e9-4cb0-b08a-d83968f187d4 · outbound

This paper cites Applied Sciences , volume =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Applied Sciences , volume =

Reference 3

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:22.145714Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-18T06:34:40.430872+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.668780Z digest=sha256:34d9237fedee4f1d3d93bdc6b411a95c4ce0df80f721163b2d6b9861060ebe57

Observation 38860290-b142-408f-9248-91f8a0efa6c6 · outbound

This paper cites Metrology, Inspection, and Process Control XXXVI , volume =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Metrology, Inspection, and Process Control XXXVI , volume =

Reference 4

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:22.131106Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-18T06:34:40.430872+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.673398Z digest=sha256:72e1d991c0f56a81307b7bd30c255571b11ba7f9b5951174e2eb2a0941ac61b1

Observation b0758f2a-252a-4121-9ffd-bbb5ec1bd369 · outbound

This paper cites Journal of Micro/Nanopatterning, Materials, and Metrology , volume =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Journal of Micro/Nanopatterning, Materials, and Metrology , volume =

Reference 5

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:22.117050Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-18T06:34:40.430872+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.678156Z digest=sha256:d9e7620884f43abb27bfd15771510806b53a8742a6ebb44384ae073ecd840f17

Observation b1ef3c15-735a-453c-9a46-66cbe2b7dfd5 · outbound

This paper cites 38th European Mask and Lithography Conference (EMLC 2023) , volume =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds 38th European Mask and Lithography Conference (EMLC 2023) , volume =

Reference 6

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:22.102176Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-18T06:34:40.430872+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.682593Z digest=sha256:6739d686dcb8e5027c6c1b47beab5eafa362d2f84f2004cb03f93d9782837cf1

Observation aa91b184-3e3d-4adc-8c9a-71b7bdc28958 · outbound

This paper cites Proceedings of the IEEE/CVF Conference on Computer Vision and Pattern Recognition , pages =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the IEEE/CVF Conference on Computer Vision and Pattern Recognition , pages =

Reference 7

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:22.088122Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-18T06:34:40.430872+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.686954Z digest=sha256:23c50a319c953681959f9b8879c0991c424bb2cf1df138894ce1fbe696e041f4

Observation 68e2eacf-4e6f-4e09-809e-5c5507bf4088 · outbound

This paper cites International Journal of Computer Vision , volume =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds International Journal of Computer Vision , volume =

Reference 8

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:22.074675Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-18T06:34:40.430872+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.691786Z digest=sha256:4ed2ef53dbb13a1088050f37d9978d4311306e92b183ffe5e7f2d6c5ff00fed1

Observation 0960d7c2-656b-413c-8290-3828d1d98597 · outbound

This paper cites SPot-the-Difference Self-Supervised Pre-training for Anomaly Detection and Segmentation.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds SPot-the-Difference Self-Supervised Pre-training for Anomaly Detection and Segmentation

Reference 9

Resolution
unresolved
no resolver link, observed 2026-08-15T14:55:21.696337Z

Source-reported events for the cited work

Unavailable: canonical work link unavailable.

source=arxiv_source observed=2026-08-15T14:55:21.696337Z digest=sha256:571e9212c3825326e37bf2bea413c8c5c18f07f06279f1a9ec6b112e00a6adb1

Observation fe559699-281c-44c0-a7b7-384887e75cc2 · outbound

This paper cites Proceedings of the IEEE/CVF Conference on Computer Vision and Pattern Recognition , year =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the IEEE/CVF Conference on Computer Vision and Pattern Recognition , year =

Reference 10

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:22.060659Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-18T06:34:40.430872+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.701057Z digest=sha256:8149792edf526626bcced697ddfc04f68be997f9fa70a0fa17ca3fa45bc0bdb3

Observation 76063931-1fec-449c-a9ed-1e197cedecf0 · outbound

This paper cites Pattern Recognition.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Pattern Recognition

Reference 11

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:22.047001Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-18T06:34:40.430872+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.705286Z digest=sha256:76aa4311b8720d407129859e9bd4bde1feb8388d2d8e577d936795a7beef4770

Observation 7f33466e-3b2c-4e3d-b255-a4f1e85e2ab2 · outbound

This paper cites Proceedings of the IEEE/CVF International Conference on Computer Vision , pages =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the IEEE/CVF International Conference on Computer Vision , pages =

Reference 12

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:22.032727Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-18T06:34:40.430872+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.709843Z digest=sha256:2beb6035567029f5eaae3c6c4cc4c1988f4ab7986dc6584df8e0d52aae05d5e2

Observation 73344078-d8eb-4271-b551-5b8e2f32a045 · outbound

This paper cites Proceedings of the IEEE/CVF Conference on Computer Vision and Pattern Recognition , pages =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the IEEE/CVF Conference on Computer Vision and Pattern Recognition , pages =

Reference 13

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:22.017897Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-18T06:34:40.430872+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.714492Z digest=sha256:d48e57f1925954ba42b8febdb8d24c44d2c1f01b1b3958b43b1eb6cacaabe6f2

Observation 1ca137a1-2a5b-4edc-924d-42db35b868a3 · outbound

This paper cites Proceedings of the IEEE/CVF Winter Conference on Applications of Computer Vision , pages =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the IEEE/CVF Winter Conference on Applications of Computer Vision , pages =

Reference 14

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:22.002432Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-18T06:34:40.430872+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.718939Z digest=sha256:8d7ee58762b2cc59dfbe1380b04cd99939d96a599054e3b9455e1fbafff87a25

Observation a92d96c8-b979-49ed-a223-8f4673e1e6c3 · outbound

This paper cites Proceedings of the 38th International Conference on Machine Learning , volume =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the 38th International Conference on Machine Learning , volume =

Reference 15

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:21.987694Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-18T06:34:40.430872+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.723380Z digest=sha256:531841e906b722fec5f0aa0d9561b685980bcf2ba0bdf64855af69ae49125e62

Observation 7b398f19-e568-4c21-ada0-2e26cc9b3f19 · outbound

This paper cites Proceedings of the IEEE/CVF Conference on Computer Vision and Pattern Recognition , pages =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the IEEE/CVF Conference on Computer Vision and Pattern Recognition , pages =

Reference 16

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:21.972098Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-18T06:34:40.430872+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.728045Z digest=sha256:755632d7cecc791717d557d6fc8efa1d47aa809b5a2ec3ac7fe58592f3d526e7

Observation ed13a3ce-b108-4fba-8548-b8f57d7f22cf · outbound

This paper cites International Conference on Learning Representations , year =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds International Conference on Learning Representations , year =

Reference 17

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:21.956349Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-18T06:34:40.430872+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.732722Z digest=sha256:14918424d5c2f31a4ec62f54de1859192370015f42a54044c9da5b728072a963

Observation e13848bc-ee6a-46a9-b830-c12f2e4da4b4 · outbound

This paper cites Proceedings of the AAAI Conference on Artificial Intelligence , volume =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the AAAI Conference on Artificial Intelligence , volume =

Reference 18

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:21.941116Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-18T06:34:40.430872+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.737396Z digest=sha256:848662fb91c9834c1f20db15a2c6d65d5f5a09465d37037014ad2446eca3645b

Observation 78b93001-72d1-4b26-b049-52f712fc6a3f · outbound

This paper cites Proceedings of the 32nd ACM International Conference on Multimedia , pages =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the 32nd ACM International Conference on Multimedia , pages =

Reference 19

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:21.926749Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-18T06:34:40.430872+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.742312Z digest=sha256:f643bddac95b70720df9d91ba00e116a6fbba10c71a47cf1503a28c8c7e96c74

Observation b7aee937-1aa1-481f-bfae-8b5a7703fd9e · outbound

This paper cites International Conference on Learning Representations , year =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds International Conference on Learning Representations , year =

Reference 20

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:21.912470Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-18T06:34:40.430872+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.747306Z digest=sha256:00b43f1422187aa4c86e88d5495f743201b57bff51ae92be67d98ed0566ac9e9

Observation 8ad38380-9acd-4514-a68f-0439db4e372e · outbound

This paper cites Kosmos-2: Grounding Multimodal Large Language Models to the World.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Kosmos-2: Grounding Multimodal Large Language Models to the World

Reference 21

Resolution
unresolved
no resolver link, observed 2026-08-15T14:55:21.752461Z

Source-reported events for the cited work

Unavailable: canonical work link unavailable.

source=arxiv_source observed=2026-08-15T14:55:21.752461Z digest=sha256:a29e77bff0177584aea0ee5efd88fa08c754cd42c66e392add3a02915b67c230

Observation b5deea2e-ab00-49d6-967b-933e2b1b3d2a · outbound

This paper cites Shikra: Unleashing Multimodal LLM's Referential Dialogue Magic.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Shikra: Unleashing Multimodal LLM's Referential Dialogue Magic

Reference 22

Resolution
unresolved
no resolver link, observed 2026-08-15T14:55:21.757198Z

Source-reported events for the cited work

Unavailable: canonical work link unavailable.

source=arxiv_source observed=2026-08-15T14:55:21.757198Z digest=sha256:cce509f830bd911614d3d6e7950382655ac3740695166253103032598a2a52ef

Observation dde9f6b7-7a81-44c0-8124-197b14ea987f · outbound

This paper cites Ferret: Refer and Ground Anything Anywhere at Any Granularity.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Ferret: Refer and Ground Anything Anywhere at Any Granularity

Reference 23

Resolution
unresolved
no resolver link, observed 2026-08-15T14:55:21.761651Z

Source-reported events for the cited work

Unavailable: canonical work link unavailable.

source=arxiv_source observed=2026-08-15T14:55:21.761651Z digest=sha256:bd23b11812d2c67e535b768af01ba3ce4eb3fb3363432ca887b45699418d0d0e

Observation 8e9581c4-c544-411b-be44-22dc011e1fe9 · outbound

This paper cites Proceedings of the 2023 Conference on Empirical Methods in Natural Language Processing , pages =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the 2023 Conference on Empirical Methods in Natural Language Processing , pages =

Reference 24

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:21.897273Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-18T06:34:40.430872+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.766382Z digest=sha256:c49515072d194fe8b5e8818a4e32bfee2c183c048776e3ccc0696810a7750706

Observation bb798005-1e19-44ef-a6c9-83a01d16083c · outbound

This paper cites Proceedings of the IEEE/CVF Conference on Computer Vision and Pattern Recognition , pages =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the IEEE/CVF Conference on Computer Vision and Pattern Recognition , pages =

Reference 25

Resolution
unresolved
no resolver link, observed 2026-08-15T14:55:21.771420Z

Source-reported events for the cited work

Unavailable: canonical work link unavailable.

source=arxiv_source observed=2026-08-15T14:55:21.771420Z digest=sha256:eff6b4225ac3ceba29de76fd3d8cb14f037c83d6bb90038d137279fbaacb3c26

Observation 4cb48f33-0546-46c8-98c8-d091ce085d82 · outbound

This paper cites Educational and Psychological Measurement , volume =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Educational and Psychological Measurement , volume =

Reference 26

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:21.872356Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-18T06:34:40.430872+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.775788Z digest=sha256:90734dcc0b8f7bcc95b448ddcee705dfbdbd66248bd8204c7bd687cb326eff39

Pith citing papers

No inbound Pith citation observations are available.