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Paper Citation Record · LEDGER

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions

As of 15 August 2026, this Paper Citation Record lists 28 of 28 outbound references and 0 inbound Pith citation observations for arXiv:2608.08031.

A citation records a reference. It does not transfer a finding from one paper to another.

pith.paper-citation-record.v1
2608.08031 v1

Coverage vector

measured 28 of 28 reference resolution

Typed states for the displayed outbound observations.

Source: paper_references, paper_reference_links, observed 2026-08-12T00:36:14.618207Z

measured 28 of 28 standing notices

One-hop event checks from named stored sources.

Source: scholarly_work_events, retraction_status_cache, observed 2026-08-15T06:32:42.880941+00:00

measured 0 of 0 inbound itemization

Pith citing papers itemized under the disclosed page cap.

Source: paper_references, paper_reference_links

measured 0 of 1 external citation measurements

A source-named dated measurement, never combined with another source.

Source: cited_works

Reference resolution

28 of 28 outbound references displayed

  • verified exact0
  • verified fuzzy13
  • unresolved15
  • parse uncertain0
  • malformed identifier0
  • metadata mismatch0

External citation measurements

No source-named external measurement is stored.

Outbound references

Observation ccfb7891-e8ef-49a9-96ad-6419e7063b5c · outbound

This paper cites Abe, Y.Sonobe, and T.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Abe, Y.Sonobe, and T

Reference 1

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.909964Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-15T06:32:42.880941+00:00.

source=pdf_text observed=2026-08-12T00:36:14.520738Z digest=sha256:db9bfa8387828ddb9e94170a4cd77780996b6efa65a58a92de332e7e889c71b6

Observation 48a9934b-32ca-470f-89a5-209da6d7f35e · outbound

This paper cites Hosokawa, R.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Hosokawa, R

Reference 2

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.900726Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-15T06:32:42.880941+00:00.

source=pdf_text observed=2026-08-12T00:36:14.525588Z digest=sha256:8ec5e643d92d19b7c9e24944d3954e43b791441ecdab5cbcf398cf35dbdba29a

Observation d20b3557-5087-4608-a417-68e582709931 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 3

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.891706Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-15T06:32:42.880941+00:00.

source=pdf_text observed=2026-08-12T00:36:14.529397Z digest=sha256:60ef98b2372aa3bddc3e7192f593b96db11a9e3fe5033be442a69eb36b6c4483

Observation 3321b74e-070f-4262-9400-c8b584c18b34 · outbound

This paper cites Holland, and S.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Holland, and S

Reference 4

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.882897Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-15T06:32:42.880941+00:00.

source=pdf_text observed=2026-08-12T00:36:14.533653Z digest=sha256:9e5663e345d251bf1d0aabe36f6202c8816615e6240c11aa3622e4814d090972

Observation 3e5091d9-b6c5-4b33-8be5-5dd7db6cf36f · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 5

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.873770Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-15T06:32:42.880941+00:00.

source=pdf_text observed=2026-08-12T00:36:14.537925Z digest=sha256:1da779b5a87bdaa6fb36b8859f5c1fabf0849913ebdf5832ae9aacfbea856fa9

Observation 5c0b9888-8206-408c-a904-2e5300b4ea60 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 6

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.864943Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-15T06:32:42.880941+00:00.

source=pdf_text observed=2026-08-12T00:36:14.542073Z digest=sha256:cf07f026dd150bd7e4c55ad619cb2dbd7e1b9e75d86d6617070eeb4cc7275b98

Observation aca3addb-206e-4e84-8bc3-67f8c5032e09 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 7

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.855850Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-15T06:32:42.880941+00:00.

source=pdf_text observed=2026-08-12T00:36:14.546115Z digest=sha256:cf5fd9a7cfbf6b6ea6363dae89f773d0b7001ac51dfe84766522e9344803c1b4

Observation 58cce227-adcb-42f1-931b-608086ea17d3 · outbound

This paper cites K., Song I.-C., Lu S.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions K., Song I.-C., Lu S

Reference 8

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.846510Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-15T06:32:42.880941+00:00.

source=pdf_text observed=2026-08-12T00:36:14.549906Z digest=sha256:a5f238d84c40a1f5b4a47b41239dd6fffb57dfdb45a9c9e48f0f247cd7da9ec1

Observation 9ee41961-cf89-4ab8-8180-fc196b3d9ecf · outbound

This paper cites and Lill T.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions and Lill T

Reference 9

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.837484Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-15T06:32:42.880941+00:00.

source=pdf_text observed=2026-08-12T00:36:14.553475Z digest=sha256:f76ba27f5bc92f34dea3f897ca43cafb4b5a8df1694a1219d66a3f916d1b0087

Observation 0707c76a-3a2b-4f6b-b15f-c59d33e79f77 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 10

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.828069Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-15T06:32:42.880941+00:00.

source=pdf_text observed=2026-08-12T00:36:14.556702Z digest=sha256:04bd530f10de9b8950f83471f7a380f00d45ef1eac223e1fc6f42574a1aba2c5

Observation 9b397afe-6d8f-48db-a2c4-44b7608d7d9e · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 11

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.819269Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-15T06:32:42.880941+00:00.

source=pdf_text observed=2026-08-12T00:36:14.559885Z digest=sha256:ce16401e9031584bdc15db196ffb8e693fdb207d9cd628624e0ea7e1e6ddf82e

Observation 1d083fb2-f8cc-43ee-ab6e-3b55370a3a29 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 12

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.809953Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-15T06:32:42.880941+00:00.

source=pdf_text observed=2026-08-12T00:36:14.563347Z digest=sha256:02a550940bb6c2c93d9266a5023d96a8c1889d2ae7cc1a8bcd94b9752dbb4aa9

Observation 665d2e67-53ac-465e-8fed-f42704e1b270 · outbound

This paper cites Tachi, K.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Tachi, K

Reference 13

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.801035Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-15T06:32:42.880941+00:00.

source=pdf_text observed=2026-08-12T00:36:14.566625Z digest=sha256:563d264e97bb83bad4763a99717af7272562a518e685cf51b393e4c82dc5d89e

Observation c9984631-9f8d-442e-97c5-849f4374bc14 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 14

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.792683Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-15T06:32:42.880941+00:00.

source=pdf_text observed=2026-08-12T00:36:14.569923Z digest=sha256:46e73ab053214580ba345edaf259f108297d83d9b20375fd8eb843fac0fd80fd

Observation 605f413c-66a2-4f3b-b428-7f49e0046282 · outbound

This paper cites Karahashi, K.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Karahashi, K

Reference 15

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.784057Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-15T06:32:42.880941+00:00.

source=pdf_text observed=2026-08-12T00:36:14.573345Z digest=sha256:eff3dab87f6ca20ceaa258fb87f45419c58bcce2a2537cb91361b811ef4f5c0c

Observation 4b58c1ae-2798-44c6-ac1d-d8c4cbf6a414 · outbound

This paper cites Karahashi, and S.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Karahashi, and S

Reference 16

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.773962Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-15T06:32:42.880941+00:00.

source=pdf_text observed=2026-08-12T00:36:14.576507Z digest=sha256:752118648c002a9eb01a81d238a646546627036c3d6825e689a214f99201cea1

Observation 5cba6fc6-dfad-4074-af30-c2d36ed99e73 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 17

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.764636Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-15T06:32:42.880941+00:00.

source=pdf_text observed=2026-08-12T00:36:14.579640Z digest=sha256:13b66fc57f7ee58651faa2da55a48818b25e19f276c0e9d510db672d696c385e

Observation 70511fbb-d1e8-4491-8157-6e570225f465 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 18

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.754542Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-15T06:32:42.880941+00:00.

source=pdf_text observed=2026-08-12T00:36:14.583233Z digest=sha256:402ce85793b97913fc4110bb607f0b500f1824a24804932cd6dad1cd94b24ee3

Observation fc77de31-f03a-4844-8e58-56a654ec70fb · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 19

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.744927Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-15T06:32:42.880941+00:00.

source=pdf_text observed=2026-08-12T00:36:14.586396Z digest=sha256:7035090115d3b9d3732970acf8bec1a411d9f8e6954b7613ac483fcbc2143c8d

Observation 320aa820-613f-4ea6-9002-3bb98604d875 · outbound

This paper cites Karahashi, J.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Karahashi, J

Reference 20

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.735610Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-15T06:32:42.880941+00:00.

source=pdf_text observed=2026-08-12T00:36:14.589628Z digest=sha256:35e8391e92e6b9fe36594f7a23b4a067eb2dd22d7566110c47bf504f7ef5ef93

Observation bbd81f71-efe8-46aa-b09f-5099eb3c8e07 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 21

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.725114Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-15T06:32:42.880941+00:00.

source=pdf_text observed=2026-08-12T00:36:14.592861Z digest=sha256:f51896260cb18c3d86d074671fd445e5d2634f63e619d000151551da48eb3b3c

Observation 0f6a3650-74eb-4f33-a3ff-30cf8a323ac7 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 22

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.714947Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-15T06:32:42.880941+00:00.

source=pdf_text observed=2026-08-12T00:36:14.596750Z digest=sha256:ccd6591cc66040f4d665b16c3b85444fd60b8e854a3575c65bdb28458f7c5571

Observation 62c89377-ab02-4b73-a9b9-a4bbb33f7db9 · outbound

This paper cites Karahashi, J.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Karahashi, J

Reference 23

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.703032Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-15T06:32:42.880941+00:00.

source=pdf_text observed=2026-08-12T00:36:14.600333Z digest=sha256:9c64c76b0b92888932ab532d45838c3d3e3505c4d35b94a29342a33e1a4a79e7

Observation dbf877d8-2fc8-42ae-b0e9-3556006a1f3b · outbound

This paper cites Szabó, P.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Szabó, P

Reference 24

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.690226Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-15T06:32:42.880941+00:00.

source=pdf_text observed=2026-08-12T00:36:14.603754Z digest=sha256:0b79657b88a4aae7ddaa49b66f3403b25d32fc70f82460002c6671bad3ecbb72

Observation ca6a4ca7-a93c-4785-8370-d0fa822ab9ca · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 25

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.678592Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-15T06:32:42.880941+00:00.

source=pdf_text observed=2026-08-12T00:36:14.607309Z digest=sha256:9bfc190ed382c77ec67f3e17a636ae62498f1d1e9a53518b76cdabdf5a6efa58

Observation 5ac5b356-52b3-4610-9cbb-3d3677068f46 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 26

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.667404Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-15T06:32:42.880941+00:00.

source=pdf_text observed=2026-08-12T00:36:14.611105Z digest=sha256:4c05a69cc1319d9dc3269a9b7cbd6a3b2a279297ab63ef2ce41d1c2895c07c85

Observation 818f8c8b-a07a-4f93-a7c1-1fa25d1d2cdf · outbound

This paper cites Chang, T.-H.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Chang, T.-H

Reference 27

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.657917Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-15T06:32:42.880941+00:00.

source=pdf_text observed=2026-08-12T00:36:14.614818Z digest=sha256:1c5c255dea51b26e3fcbcfffce39769bb5a11aa9c79f258e9addda8b7b1f4fef

Observation ff0d01b3-006f-4671-9240-d2ddb124dfe3 · outbound

This paper cites Yanai, K.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Yanai, K

Reference 28

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.648083Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-15T06:32:42.880941+00:00.

source=pdf_text observed=2026-08-12T00:36:14.618207Z digest=sha256:79107d8a97b4be5a33bddaef7efdcda192f736e61f4913438f094d22ee9bed18

Pith citing papers

No inbound Pith citation observations are available.