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Paper Citation Record · LEDGER

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds

As of 18 August 2026, this Paper Citation Record lists 26 of 26 outbound references and 0 inbound Pith citation observations for arXiv:2608.03078.

A citation records a reference. It does not transfer a finding from one paper to another.

pith.paper-citation-record.v1
2608.03078 v1

Coverage vector

measured 26 of 26 reference resolution

Typed states for the displayed outbound observations.

Source: paper_references, paper_reference_links, observed 2026-08-15T14:55:21.775788Z

measured 26 of 26 standing notices

One-hop event checks from named stored sources.

Source: scholarly_work_events, retraction_status_cache, observed 2026-08-17T06:30:58.91139+00:00

measured 0 of 0 inbound itemization

Pith citing papers itemized under the disclosed page cap.

Source: paper_references, paper_reference_links

measured 0 of 1 external citation measurements

A source-named dated measurement, never combined with another source.

Source: cited_works

Reference resolution

26 of 26 outbound references displayed

  • verified exact0
  • verified fuzzy21
  • unresolved5
  • parse uncertain0
  • malformed identifier0
  • metadata mismatch0

External citation measurements

No source-named external measurement is stored.

Outbound references

Observation 3b671c50-aa8c-461b-9c10-7eea14552e23 · outbound

This paper cites International Journal of Fuzzy Logic and Intelligent Systems , volume =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds International Journal of Fuzzy Logic and Intelligent Systems , volume =

Reference 1

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:22.173258Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.657535Z digest=sha256:6ec0a0925a0298555f41c814e066a61aeb7c594d94d02b4f26f6d98199df9947

Observation 13f2eae1-9ec5-456f-b538-62102eaf07a9 · outbound

This paper cites 2017 30th IEEE International System-on-Chip Conference (SOCC) , pages =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds 2017 30th IEEE International System-on-Chip Conference (SOCC) , pages =

Reference 2

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:22.159572Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.662856Z digest=sha256:4686a8c989eb954bbabfc6c2c4356a35112d930426fa7d2b9af24ddfe8203fa2

Observation ed9e21e8-77e9-4cb0-b08a-d83968f187d4 · outbound

This paper cites Applied Sciences , volume =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Applied Sciences , volume =

Reference 3

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:22.145714Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.668780Z digest=sha256:9a678353f88e25252c9f02c51a133bc1ee17d247d9229b7ca22d5b8f18914c69

Observation 38860290-b142-408f-9248-91f8a0efa6c6 · outbound

This paper cites Metrology, Inspection, and Process Control XXXVI , volume =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Metrology, Inspection, and Process Control XXXVI , volume =

Reference 4

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:22.131106Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.673398Z digest=sha256:dfdf867247cd39e2c453da9b99fecf59bf25acfdc4446e1eaf479eb251f0787f

Observation b0758f2a-252a-4121-9ffd-bbb5ec1bd369 · outbound

This paper cites Journal of Micro/Nanopatterning, Materials, and Metrology , volume =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Journal of Micro/Nanopatterning, Materials, and Metrology , volume =

Reference 5

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:22.117050Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.678156Z digest=sha256:9abfff7216be8aa40c40086c98bbeee27cd1601c7493e6547f8ccd43f34afa65

Observation b1ef3c15-735a-453c-9a46-66cbe2b7dfd5 · outbound

This paper cites 38th European Mask and Lithography Conference (EMLC 2023) , volume =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds 38th European Mask and Lithography Conference (EMLC 2023) , volume =

Reference 6

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:22.102176Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.682593Z digest=sha256:bd371d8312fd96f544edde3054e2757cf95f37e8d2c9fdf85d752499ee6ecc7d

Observation aa91b184-3e3d-4adc-8c9a-71b7bdc28958 · outbound

This paper cites Proceedings of the IEEE/CVF Conference on Computer Vision and Pattern Recognition , pages =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the IEEE/CVF Conference on Computer Vision and Pattern Recognition , pages =

Reference 7

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:22.088122Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.686954Z digest=sha256:7de25ca9ec0de8d36e4f247307e9913bcb96094d327171eec04ab152a44a6200

Observation 68e2eacf-4e6f-4e09-809e-5c5507bf4088 · outbound

This paper cites International Journal of Computer Vision , volume =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds International Journal of Computer Vision , volume =

Reference 8

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:22.074675Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.691786Z digest=sha256:e3bf36f889c61bee11c493db6d845b162a371140bd7fd5e1108bb9715f28c3be

Observation 0960d7c2-656b-413c-8290-3828d1d98597 · outbound

This paper cites SPot-the-Difference Self-Supervised Pre-training for Anomaly Detection and Segmentation.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds SPot-the-Difference Self-Supervised Pre-training for Anomaly Detection and Segmentation

Reference 9

Resolution
unresolved
no resolver link, observed 2026-08-15T14:55:21.696337Z

Source-reported events for the cited work

Unavailable: canonical work link unavailable.

source=arxiv_source observed=2026-08-15T14:55:21.696337Z digest=sha256:571e9212c3825326e37bf2bea413c8c5c18f07f06279f1a9ec6b112e00a6adb1

Observation fe559699-281c-44c0-a7b7-384887e75cc2 · outbound

This paper cites Proceedings of the IEEE/CVF Conference on Computer Vision and Pattern Recognition , year =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the IEEE/CVF Conference on Computer Vision and Pattern Recognition , year =

Reference 10

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:22.060659Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.701057Z digest=sha256:a6edb6b4675ffc3523f42a5c6c6042c1a7ac01b0e1485dd0ed62c5d9eb2dccd6

Observation 76063931-1fec-449c-a9ed-1e197cedecf0 · outbound

This paper cites Pattern Recognition.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Pattern Recognition

Reference 11

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:22.047001Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.705286Z digest=sha256:f615ce9618d7b2865b1511a3c49e3b5540a0034b219b934d8f70fd67174c9220

Observation 7f33466e-3b2c-4e3d-b255-a4f1e85e2ab2 · outbound

This paper cites Proceedings of the IEEE/CVF International Conference on Computer Vision , pages =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the IEEE/CVF International Conference on Computer Vision , pages =

Reference 12

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:22.032727Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.709843Z digest=sha256:2f8fc217b508edcc0c350325b9175001a282c9e162ad1a589f02eab77b36707c

Observation 73344078-d8eb-4271-b551-5b8e2f32a045 · outbound

This paper cites Proceedings of the IEEE/CVF Conference on Computer Vision and Pattern Recognition , pages =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the IEEE/CVF Conference on Computer Vision and Pattern Recognition , pages =

Reference 13

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:22.017897Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.714492Z digest=sha256:22c6b09ce119a369bc82fa85a1d62b11e5b9e6bc9a3bfb4e1b8b77a1102ca37b

Observation 1ca137a1-2a5b-4edc-924d-42db35b868a3 · outbound

This paper cites Proceedings of the IEEE/CVF Winter Conference on Applications of Computer Vision , pages =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the IEEE/CVF Winter Conference on Applications of Computer Vision , pages =

Reference 14

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:22.002432Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.718939Z digest=sha256:8359e9bebb282a9e4db2b65ac336dd47ec502f3bf111c345070160f53d265ab3

Observation a92d96c8-b979-49ed-a223-8f4673e1e6c3 · outbound

This paper cites Proceedings of the 38th International Conference on Machine Learning , volume =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the 38th International Conference on Machine Learning , volume =

Reference 15

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:21.987694Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.723380Z digest=sha256:50dedd2c5bebb6f6bb827cd8136c3a9d3225185263f916161eb0cd2f235f4b1d

Observation 7b398f19-e568-4c21-ada0-2e26cc9b3f19 · outbound

This paper cites Proceedings of the IEEE/CVF Conference on Computer Vision and Pattern Recognition , pages =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the IEEE/CVF Conference on Computer Vision and Pattern Recognition , pages =

Reference 16

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:21.972098Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.728045Z digest=sha256:d636bf5b66bb30215e90fd6fba9cabea11482298c379a08a4887cacc90c53a23

Observation ed13a3ce-b108-4fba-8548-b8f57d7f22cf · outbound

This paper cites International Conference on Learning Representations , year =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds International Conference on Learning Representations , year =

Reference 17

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:21.956349Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.732722Z digest=sha256:f8aad0cdd8847d2dbe8f82484c60380e5e28460b6a10216818e5332bb7011e72

Observation e13848bc-ee6a-46a9-b830-c12f2e4da4b4 · outbound

This paper cites Proceedings of the AAAI Conference on Artificial Intelligence , volume =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the AAAI Conference on Artificial Intelligence , volume =

Reference 18

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:21.941116Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.737396Z digest=sha256:78ca5162bb8ed940bb34a5222ab6275a78e71e9e2d5f45188c250f923c015deb

Observation 78b93001-72d1-4b26-b049-52f712fc6a3f · outbound

This paper cites Proceedings of the 32nd ACM International Conference on Multimedia , pages =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the 32nd ACM International Conference on Multimedia , pages =

Reference 19

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:21.926749Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.742312Z digest=sha256:cb0f2120a4702768f29d01bf3ee08944b82f3c843df3f0a54a1cd10ee035003c

Observation b7aee937-1aa1-481f-bfae-8b5a7703fd9e · outbound

This paper cites International Conference on Learning Representations , year =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds International Conference on Learning Representations , year =

Reference 20

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:21.912470Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.747306Z digest=sha256:5edb47cc8b472530f9564acfaf876349e01c6c584def0c35c4b8bf90b05322e2

Observation 8ad38380-9acd-4514-a68f-0439db4e372e · outbound

This paper cites Kosmos-2: Grounding Multimodal Large Language Models to the World.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Kosmos-2: Grounding Multimodal Large Language Models to the World

Reference 21

Resolution
unresolved
no resolver link, observed 2026-08-15T14:55:21.752461Z

Source-reported events for the cited work

Unavailable: canonical work link unavailable.

source=arxiv_source observed=2026-08-15T14:55:21.752461Z digest=sha256:a29e77bff0177584aea0ee5efd88fa08c754cd42c66e392add3a02915b67c230

Observation b5deea2e-ab00-49d6-967b-933e2b1b3d2a · outbound

This paper cites Shikra: Unleashing Multimodal LLM's Referential Dialogue Magic.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Shikra: Unleashing Multimodal LLM's Referential Dialogue Magic

Reference 22

Resolution
unresolved
no resolver link, observed 2026-08-15T14:55:21.757198Z

Source-reported events for the cited work

Unavailable: canonical work link unavailable.

source=arxiv_source observed=2026-08-15T14:55:21.757198Z digest=sha256:cce509f830bd911614d3d6e7950382655ac3740695166253103032598a2a52ef

Observation dde9f6b7-7a81-44c0-8124-197b14ea987f · outbound

This paper cites Ferret: Refer and Ground Anything Anywhere at Any Granularity.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Ferret: Refer and Ground Anything Anywhere at Any Granularity

Reference 23

Resolution
unresolved
no resolver link, observed 2026-08-15T14:55:21.761651Z

Source-reported events for the cited work

Unavailable: canonical work link unavailable.

source=arxiv_source observed=2026-08-15T14:55:21.761651Z digest=sha256:bd23b11812d2c67e535b768af01ba3ce4eb3fb3363432ca887b45699418d0d0e

Observation 8e9581c4-c544-411b-be44-22dc011e1fe9 · outbound

This paper cites Proceedings of the 2023 Conference on Empirical Methods in Natural Language Processing , pages =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the 2023 Conference on Empirical Methods in Natural Language Processing , pages =

Reference 24

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:21.897273Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.766382Z digest=sha256:6f1b8f8d40475019b58505b32c6c629b139e6926a630acda6286b4e141810e3a

Observation bb798005-1e19-44ef-a6c9-83a01d16083c · outbound

This paper cites Proceedings of the IEEE/CVF Conference on Computer Vision and Pattern Recognition , pages =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Proceedings of the IEEE/CVF Conference on Computer Vision and Pattern Recognition , pages =

Reference 25

Resolution
unresolved
no resolver link, observed 2026-08-15T14:55:21.771420Z

Source-reported events for the cited work

Unavailable: canonical work link unavailable.

source=arxiv_source observed=2026-08-15T14:55:21.771420Z digest=sha256:eff6b4225ac3ceba29de76fd3d8cb14f037c83d6bb90038d137279fbaacb3c26

Observation 4cb48f33-0546-46c8-98c8-d091ce085d82 · outbound

This paper cites Educational and Psychological Measurement , volume =.

LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds Educational and Psychological Measurement , volume =

Reference 26

Resolution
verified fuzzy
raw_fallback, observed 2026-08-15T14:55:21.872356Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-17T06:30:58.91139+00:00.

source=arxiv_source observed=2026-08-15T14:55:21.775788Z digest=sha256:1c9d931dd84a2a885db3e80c5e20b2a301f15ed7e234fd055b007340110853d5

Pith citing papers

No inbound Pith citation observations are available.