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Paper Citation Record · LEDGER

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions

As of 15 August 2026, this Paper Citation Record lists 28 of 28 outbound references and 0 inbound Pith citation observations for arXiv:2608.08031.

A citation records a reference. It does not transfer a finding from one paper to another.

pith.paper-citation-record.v1
2608.08031 v1

Coverage vector

measured 28 of 28 reference resolution

Typed states for the displayed outbound observations.

Source: paper_references, paper_reference_links, observed 2026-08-12T00:36:14.618207Z

measured 28 of 28 standing notices

One-hop event checks from named stored sources.

Source: scholarly_work_events, retraction_status_cache, observed 2026-08-14T06:32:32.682623+00:00

measured 0 of 0 inbound itemization

Pith citing papers itemized under the disclosed page cap.

Source: paper_references, paper_reference_links

measured 0 of 1 external citation measurements

A source-named dated measurement, never combined with another source.

Source: cited_works

Reference resolution

28 of 28 outbound references displayed

  • verified exact0
  • verified fuzzy13
  • unresolved15
  • parse uncertain0
  • malformed identifier0
  • metadata mismatch0

External citation measurements

No source-named external measurement is stored.

Outbound references

Observation ccfb7891-e8ef-49a9-96ad-6419e7063b5c · outbound

This paper cites Abe, Y.Sonobe, and T.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Abe, Y.Sonobe, and T

Reference 1

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.909964Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-14T06:32:32.682623+00:00.

source=pdf_text observed=2026-08-12T00:36:14.520738Z digest=sha256:ddf4217f854fd011f8a3e3e0b668cb99f55e00c0c7903b2e5e367960cfd60dc1

Observation 48a9934b-32ca-470f-89a5-209da6d7f35e · outbound

This paper cites Hosokawa, R.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Hosokawa, R

Reference 2

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.900726Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-14T06:32:32.682623+00:00.

source=pdf_text observed=2026-08-12T00:36:14.525588Z digest=sha256:3ea5d14f6f081d03358986c5da3980623ebfd915ef4ce1aa55dea715b5f8d392

Observation d20b3557-5087-4608-a417-68e582709931 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 3

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.891706Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-14T06:32:32.682623+00:00.

source=pdf_text observed=2026-08-12T00:36:14.529397Z digest=sha256:1693c59ad089926fe0adafbc468c96cbe2ad26126217fb66ae946be28a584a92

Observation 3321b74e-070f-4262-9400-c8b584c18b34 · outbound

This paper cites Holland, and S.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Holland, and S

Reference 4

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.882897Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-14T06:32:32.682623+00:00.

source=pdf_text observed=2026-08-12T00:36:14.533653Z digest=sha256:4cf5953e0bd1390795e27cb802cb5bc8ffd9f96c1d3b1b7f028318bd2556c0cc

Observation 3e5091d9-b6c5-4b33-8be5-5dd7db6cf36f · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 5

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.873770Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-14T06:32:32.682623+00:00.

source=pdf_text observed=2026-08-12T00:36:14.537925Z digest=sha256:2ace729e140dc0b68de4ecc60b126aaface1d520ef7e37f14b1be050d1f37123

Observation 5c0b9888-8206-408c-a904-2e5300b4ea60 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 6

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.864943Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-14T06:32:32.682623+00:00.

source=pdf_text observed=2026-08-12T00:36:14.542073Z digest=sha256:0c4dab6c83882229f0f324620dac2930636625fca4552785c801f32cf44b23ad

Observation aca3addb-206e-4e84-8bc3-67f8c5032e09 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 7

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.855850Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-14T06:32:32.682623+00:00.

source=pdf_text observed=2026-08-12T00:36:14.546115Z digest=sha256:15e7f13eedb09ac908c059b92c2117fd480a018446f15580ceb872f1bfe54e0d

Observation 58cce227-adcb-42f1-931b-608086ea17d3 · outbound

This paper cites K., Song I.-C., Lu S.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions K., Song I.-C., Lu S

Reference 8

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.846510Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-14T06:32:32.682623+00:00.

source=pdf_text observed=2026-08-12T00:36:14.549906Z digest=sha256:3007b044404b3558876fa019383d3e8e886dc4bd3d424f80112646b36c3db8b7

Observation 9ee41961-cf89-4ab8-8180-fc196b3d9ecf · outbound

This paper cites and Lill T.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions and Lill T

Reference 9

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.837484Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-14T06:32:32.682623+00:00.

source=pdf_text observed=2026-08-12T00:36:14.553475Z digest=sha256:824103469423140fe89f848ff7441067595dc2c877ed7001a1c85cec51f8047f

Observation 0707c76a-3a2b-4f6b-b15f-c59d33e79f77 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 10

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.828069Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-14T06:32:32.682623+00:00.

source=pdf_text observed=2026-08-12T00:36:14.556702Z digest=sha256:eb6e6c751e5facfd1fd9af24c36419ce06f8063fb9822759bfa1c21b5403df86

Observation 9b397afe-6d8f-48db-a2c4-44b7608d7d9e · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 11

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.819269Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-14T06:32:32.682623+00:00.

source=pdf_text observed=2026-08-12T00:36:14.559885Z digest=sha256:16040d1dcea5ed490bf548168dbac0fdc8a0eb8f9e4aebc3198647e8117027bb

Observation 1d083fb2-f8cc-43ee-ab6e-3b55370a3a29 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 12

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.809953Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-14T06:32:32.682623+00:00.

source=pdf_text observed=2026-08-12T00:36:14.563347Z digest=sha256:c7ec07a71c8dd3295ed2c2f95c26c0835cb80c0a5da0ec8b7c1ba91ec879cee3

Observation 665d2e67-53ac-465e-8fed-f42704e1b270 · outbound

This paper cites Tachi, K.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Tachi, K

Reference 13

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.801035Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-14T06:32:32.682623+00:00.

source=pdf_text observed=2026-08-12T00:36:14.566625Z digest=sha256:7954a192eddb23b58cd47e9393f326792918376bd5911c85fc0d9597bb1d376e

Observation c9984631-9f8d-442e-97c5-849f4374bc14 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 14

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.792683Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-14T06:32:32.682623+00:00.

source=pdf_text observed=2026-08-12T00:36:14.569923Z digest=sha256:329bf6465d5eaab62d055f8eddf736f390639b03d2206b183fef6eca1469766f

Observation 605f413c-66a2-4f3b-b428-7f49e0046282 · outbound

This paper cites Karahashi, K.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Karahashi, K

Reference 15

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.784057Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-14T06:32:32.682623+00:00.

source=pdf_text observed=2026-08-12T00:36:14.573345Z digest=sha256:a3281a425fa4ada1d04a4802b396ff83a8006be7a02a6e22ffc4978827a074b6

Observation 4b58c1ae-2798-44c6-ac1d-d8c4cbf6a414 · outbound

This paper cites Karahashi, and S.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Karahashi, and S

Reference 16

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.773962Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-14T06:32:32.682623+00:00.

source=pdf_text observed=2026-08-12T00:36:14.576507Z digest=sha256:1d1955c0aa09e3848cf3b1caf08d26b2470ae7618940c960980dd4fea8d29b46

Observation 5cba6fc6-dfad-4074-af30-c2d36ed99e73 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 17

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.764636Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-14T06:32:32.682623+00:00.

source=pdf_text observed=2026-08-12T00:36:14.579640Z digest=sha256:6f4924295d6330bfeeea1fa9468b63d2c04e90f217f3b7ec3913004a91f7dd99

Observation 70511fbb-d1e8-4491-8157-6e570225f465 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 18

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.754542Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-14T06:32:32.682623+00:00.

source=pdf_text observed=2026-08-12T00:36:14.583233Z digest=sha256:7c7fbfec4bc52a296536f71a10b3e6ae98de34129589f6f6ad21c9e1c60af829

Observation fc77de31-f03a-4844-8e58-56a654ec70fb · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 19

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.744927Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-14T06:32:32.682623+00:00.

source=pdf_text observed=2026-08-12T00:36:14.586396Z digest=sha256:4908b4f0c4fdf66dec805e6b1644fd0902ef931737432a791d7be0d94fea9447

Observation 320aa820-613f-4ea6-9002-3bb98604d875 · outbound

This paper cites Karahashi, J.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Karahashi, J

Reference 20

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.735610Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-14T06:32:32.682623+00:00.

source=pdf_text observed=2026-08-12T00:36:14.589628Z digest=sha256:508102147a5b0dff7c3bca09f4c99abebb6d933b61980f8be145ca0d8c31ef45

Observation bbd81f71-efe8-46aa-b09f-5099eb3c8e07 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 21

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.725114Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-14T06:32:32.682623+00:00.

source=pdf_text observed=2026-08-12T00:36:14.592861Z digest=sha256:956e5f7ed0b3fba33926fcc306f1bd9b731d427f0fa505587b75d676937df364

Observation 0f6a3650-74eb-4f33-a3ff-30cf8a323ac7 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 22

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.714947Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-14T06:32:32.682623+00:00.

source=pdf_text observed=2026-08-12T00:36:14.596750Z digest=sha256:1b8ee75beae5eeb6196d9d493d595eac7800cc0ef860a2cc9230c3a90093def4

Observation 62c89377-ab02-4b73-a9b9-a4bbb33f7db9 · outbound

This paper cites Karahashi, J.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Karahashi, J

Reference 23

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.703032Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-14T06:32:32.682623+00:00.

source=pdf_text observed=2026-08-12T00:36:14.600333Z digest=sha256:c7a23866e2301ce61d424826241b7dbda438c33a7b15698c04c9d022c5eea6c8

Observation dbf877d8-2fc8-42ae-b0e9-3556006a1f3b · outbound

This paper cites Szabó, P.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Szabó, P

Reference 24

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.690226Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-14T06:32:32.682623+00:00.

source=pdf_text observed=2026-08-12T00:36:14.603754Z digest=sha256:b72cdaf211fe26accd38c3e9cbb1e6c3ecc996fe918509d3f6f2bcfc0b8ddb70

Observation ca6a4ca7-a93c-4785-8370-d0fa822ab9ca · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 25

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.678592Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-14T06:32:32.682623+00:00.

source=pdf_text observed=2026-08-12T00:36:14.607309Z digest=sha256:48a5430cdb3985fe023c2402b3ee506a857ed89f2dd9e69a415a389e6e76a8d2

Observation 5ac5b356-52b3-4610-9cbb-3d3677068f46 · outbound

This paper cites an unresolved cited work.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Unresolved cited work

Reference 26

Resolution
unresolved
raw_fallback, observed 2026-08-12T00:36:14.667404Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-14T06:32:32.682623+00:00.

source=pdf_text observed=2026-08-12T00:36:14.611105Z digest=sha256:06da0da1c2d558d320daefa739b0e8d2cb7391d776a3e1504c681d2a5892c7f5

Observation 818f8c8b-a07a-4f93-a7c1-1fa25d1d2cdf · outbound

This paper cites Chang, T.-H.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Chang, T.-H

Reference 27

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.657917Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-14T06:32:32.682623+00:00.

source=pdf_text observed=2026-08-12T00:36:14.614818Z digest=sha256:d7e39b58b6f58f0bf5a959404a64d63036435598fd8f44056a843e5eb5898cd4

Observation ff0d01b3-006f-4671-9240-d2ddb124dfe3 · outbound

This paper cites Yanai, K.

Beam experiments for reactive ion etching of silicon (Si)-based materials by silicon halide ions Yanai, K

Reference 28

Resolution
verified fuzzy
raw_fallback, observed 2026-08-12T00:36:14.648083Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-14T06:32:32.682623+00:00.

source=pdf_text observed=2026-08-12T00:36:14.618207Z digest=sha256:96e7e991dad035d7301468cd8cf00672e4b1acc3eace73b5a7261326bb51f0e8

Pith citing papers

No inbound Pith citation observations are available.