Interface, bulk and surface structure of heteroepitaxial altermagnetic {\alpha}-MnTe films grown on GaAs(111)

Epitaxial MnTe films have recently seen a spur of research into their altermagnetic semiconducting properties. However, those properties may be extremely sensitive to structural and chemical modifications. We report a detailed investigation of the synthesis of the altermagnet {\alpha}-MnTe on GaAs(111) which reveals the bulk defect structure of this material, the mechanism by which it releases strain from the underlying substrate and the impact of oxidation on its surface. X-ray diffraction measurements show that {\alpha}-MnTe layers with thicknesses spanning 45nm to 640nm acquire lattice parameters different from bulk mostly due to thermal strain caused by the substrate rather than strain from the lattice mismatch. Through high resolution transmission electron microscopy (TEM) measurement, we then unveil a misfit dislocation array at the interface, revealing the mechanism by which lattice strain is relaxed. TEM also reveals a stacking fault in the bulk, occurring along a glide plane parallel to the interface. The combination of TEM with polarized neutron reflectometry measurements finally reveals the impact of oxidation on the chemistry of the surface of uncapped MnTe. Our findings highlight the subtle role of epitaxy in altering the structure of {\alpha}-MnTe providing potential opportunities to tune the altermagnetic properties of this material.