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Maxim Krasilnikov

Identifiers

  • name variant Maxim Krasilnikov 0.60 · backfill

Papers (1)

  1. Wet Scandium Etching for hard mask formation on a silicon substrate physics.app-ph · 2021 · author #4

Mentions

  • 2110.13639 #4 · arxiv_oai · confidence 0.70 Maxim Krasilnikov

Frequent Coauthors