pith. sign in

Do Im

Identifiers

  • name variant Do Im 0.60 · backfill

Papers (5)

  1. Apparatus and method for plasma processing of SRF cavities physics.acc-ph · 2015 · author #2
  2. Reversal of the Asymmetry in a Cylindrical Coaxial Capacitively Coupled Ar/Cl2 Plasma physics.acc-ph · 2015 · author #2
  3. Self-bias Dependence on Process Parameters in Asymmetric Cylindrical Coaxial Capacitively Coupled Plasma physics.acc-ph · 2015 · author #2
  4. Etching Mechanism of Niobium in Coaxial Ar/Cl2 RF Plasma physics.acc-ph · 2014 · author #2
  5. Plasma Processing of Large Curved Surfaces for SRF Cavity Modification physics.acc-ph · 2014 · author #2

Mentions

  • 1511.04464 #2 · backfill · confidence 0.70 Do Im
  • 1507.00059 #2 · backfill · confidence 0.70 Do Im
  • 1506.05167 #2 · backfill · confidence 0.70 Do Im
  • 1411.0176 #2 · backfill · confidence 0.70 Do Im
  • 1411.0175 #2 · backfill · confidence 0.70 Do Im

Frequent Coauthors