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C. C. Pla Cid

Identifiers

  • name variant C. C. Pla Cid 0.60 · backfill

Papers (1)

  1. Substrate effects and diffusion dominated roughening in Cu2O electrodeposition cond-mat.mtrl-sci · 2015 · author #4

Mentions

  • 1509.04787 #4 · backfill · confidence 0.70 C. C. Pla Cid

Frequent Coauthors