Farwah Nahif

Identifiers

• name variant Farwah Nahif 0.60 · backfill

Papers (1)

1. Bimodal substrate biasing to control \gamma-Al2O3 deposition during reactive magnetron sputtering physics.plasm-ph · 2013 · author #5

Mentions

• 1305.4805 #5 · backfill · confidence 0.70 Farwah Nahif

Frequent Coauthors

• Achim von Keudell 1 shared papers
• Adrian Stein 1 shared papers
• Annika Kortmann 1 shared papers
• Jochen M. Schneider 1 shared papers
• Marina Prenzel 1 shared papers