A cryogenic widefield NV-diamond microscope images flux trapping in Nb films and patterned strips, revealing a crossover in vortex expulsion behavior between 10 and 20 μm widths that agrees with theory.
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2 Pith papers cite this work. Polarity classification is still indexing.
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Pith papers citing it
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2025 2verdicts
UNVERDICTED 2representative citing papers
An on-chip SiO2/Si3N4 stencil lithography mask enables shadow evaporation of Al Josephson junctions, demonstrated with transmon qubits achieving average T1 of 75 μs.
citing papers explorer
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Flux-trapping characterization for superconducting electronics using a cryogenic widefield N-$V$ diamond microscope
A cryogenic widefield NV-diamond microscope images flux trapping in Nb films and patterned strips, revealing a crossover in vortex expulsion behavior between 10 and 20 μm widths that agrees with theory.
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On-chip stencil lithography for superconducting qubits
An on-chip SiO2/Si3N4 stencil lithography mask enables shadow evaporation of Al Josephson junctions, demonstrated with transmon qubits achieving average T1 of 75 μs.