An on-chip SiO2/Si3N4 stencil lithography mask enables shadow evaporation of Al Josephson junctions, demonstrated with transmon qubits achieving average T1 of 75 μs.
Johnson, Atomic Layer Etching of Metal Films, Metal Nitrides, and Metal Oxides with BCl3 and HF/XeF2 , Ph.D
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On-chip stencil lithography for superconducting qubits
An on-chip SiO2/Si3N4 stencil lithography mask enables shadow evaporation of Al Josephson junctions, demonstrated with transmon qubits achieving average T1 of 75 μs.