A semi-analytical reaction-diffusion model predicts halo growth in pre-patterned Ag-Cu thin films follows power-law regimes of 1/2 or 2/7 depending on growth dimensionality, with experiments matching the 2/7 regime driven by grain boundary diffusion.
Franklin, Nanomaterials in transistors: From high-performance to thin-film applications, Science 349 (2015) aab2750
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Reaction-Diffusion Driven Patterns in Immiscible Alloy Thin Films
A semi-analytical reaction-diffusion model predicts halo growth in pre-patterned Ag-Cu thin films follows power-law regimes of 1/2 or 2/7 depending on growth dimensionality, with experiments matching the 2/7 regime driven by grain boundary diffusion.