AFM nano-oxidation lithography positions GaAs quantum dots in free-standing circular Bragg gratings with 51 nm radial accuracy, delivering 245-fold photoluminescence enhancement and polarization stability below 5%.
Combined atomic force microscopy and photoluminescence imaging to select single InAs/GaAs quantum dots for quantum photonic devices
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Deterministic positioning of circular Bragg gratings using atomic force lithography for high-performance quantum dot light sources
AFM nano-oxidation lithography positions GaAs quantum dots in free-standing circular Bragg gratings with 51 nm radial accuracy, delivering 245-fold photoluminescence enhancement and polarization stability below 5%.