Citation notice #9632 · 2026-08-11 06:18:05.201739+00:00

Compact pulsed laser deposition system for in-situ polarized neutron reflectometry

cites Effect of Thermal Annealing o n Boron Diffusion, Micro-Structural, Electrical and Magnetic Properties of Laser Ablated CoFeB Thin Films, which carries a correction notice dated 2013-08-29. One-hop deterministic notice: the citation edge exists in the Pith bibliography graph; no model judged whether the citation was load-bearing.

This is not a judgment on the citing paper.

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01Evidence

Raw extraction · citation context · bibliography index 38

Applied Surface Science 2021, 568, 150857, doi:10.1016/j.apsusc.2021.150857. 38. Swamy, G.V.; Pandey, H.; Srivastava, A.K.; Dalai, M.K.; Maurya, K.K.; Rashmi; Rakshit, R.K. Effect of Thermal Annealing o n Boron Diffusion, Micro-Structural, Electrical and Magnetic Properties of Laser Ablated CoFeB Thin Films. AIP Advances 2013, 3, 072129, doi:10.1063/1.4816811. 39. Mukherjee, S.; Knut, R.; Mohseni, S.M.; Anh Nguyen, T.N.; Chung, S.; Tuan Le, Q.; Åkerman, J.; Persson, J.; Sahoo, A.; Hazarika, A.; et al. Role of Boron Diffusion in CoFeB/MgO Magnetic Tunnel Junctions. Phys. Rev. B 2015, 91, 085311, doi:10.1103/PhysRevB.91.085311. 40. An, G.-G.; Lee, J.-B.; Yang, S.-M.; Kim, J.-H.; Chung, W.-S.; Hong, J.

Parser render (TeX stripped for reading; raw above is the evidence)

Applied Surface Science 2021, 568, 150857, doi:10.1016/j.apsusc.2021.150857. 38. Swamy, G.V.; Pandey, H.; Srivastava, A.K.; Dalai, M.K.; Maurya, K.K.; Rashmi; Rakshit, R.K. Effect of Thermal Annealing o n Boron Diffusion, Micro-Structural, Electrical and Magnetic Properties of Laser Ablated CoFeB Thin Films. AIP Advances 2013, 3, 072129, doi:10.1063/1.4816811. 39. Mukherjee, S.; Knut, R.; Mohseni, S.M.; Anh Nguyen, T.N.; Chung, S.; Tuan Le, Q.; Åkerman, J.; Persson, J.; Sahoo, A.; Hazarika, A.; et al. Role of Boron Diffusion in CoFeB/MgO Magnetic Tunnel Junctions. Phys. Rev. B 2015, 91, 085311, doi:10.1103/PhysRevB.91.085311. 40. An, G.-G.; Lee, J.-B.; Yang, S.-M.; Kim, J.-H.; Chung, W.-S.; Hong, J

02Event

Type

Correction

Source

Crossref

Original DOI

10.1063/1.4816811

Notice DOI

10.1063/1.4820356

Date

2013-08-29

Title

Erratum: “Effect of thermal annealing on Boron diffusion, micro-structural, electrical and magnetic properties of laser ablated CoFeB thin films” [AIP Advances 3, 072129 (2013)]

Reasons

['Correction']

Work

Effect of Thermal Annealing o n Boron Diffusion, Micro-Structural, Electrical and Magnetic Properties of Laser Ablated CoFeB Thin Films (2013)

Schema constants (for re-runners): correction · crossref

03Dispute this notice

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