A simple solid-on-solid model of epitaxial film growth: submonolayer substrate coverage
read the original abstract
In this work we investigate influence of substrate temperature on the surface morphology for substrate coverage below one monolayer. The model of film growth is based on random deposition enriched by limited surface diffusion. Also anisotropy in the growth is involved. We found from computer simulations for simple cubic lattice and solid-on-solid model, that the surface morphology changes with increasing temperature from isotropically distributed isolated small islands, through anisotropic 1-D stripes to larger 2-D anisotropic islands and again randomly distributed single atoms. The transition is also marked in height-height correlation function dependence on temperature, as directly seen by snapshots from simulations. The results are in good qualitative agreement with already published results of kinetic Monte Carlo simulations, as well as with some experimental data.
This paper has not been read by Pith yet.
discussion (0)
Sign in with ORCID, Apple, or X to comment. Anyone can read and Pith papers without signing in.