pith. machine review for the scientific record. sign in

arxiv: 2605.12256 · v1 · submitted 2026-05-12 · ❄️ cond-mat.mtrl-sci

Recognition: no theorem link

Engineering few-layer graphene by S-doping: from sustaining linear dispersion to flat bands

Authors on Pith no claims yet

Pith reviewed 2026-05-13 04:22 UTC · model grok-4.3

classification ❄️ cond-mat.mtrl-sci
keywords S-doped graphenefew-layer grapheneband structure engineeringflat bandsDirac coneDFT calculationselectronic propertiesdoping
0
0 comments X

The pith

Sulfur doping in few-layer graphene can sustain linear dispersion, open gaps, or create flat bands near the Fermi level depending on configuration and layer count.

A machine-rendered reading of the paper's core claim, the machinery that carries it, and where it could break.

The paper uses first-principles calculations with van der Waals corrections to examine how sulfur atoms placed in the basal plane of mono-, bi-, and four-layer graphene alter its electronic bands. Different incorporation motifs produce a range of outcomes: some keep a modified Dirac cone with impurity bands away from the Fermi level, while others open a gap of about 0.4 eV or generate flat bands right at the Fermi level, accompanied by n-type doping or spin polarization in certain cases. These changes shift the overall character from metallic to insulating and from linear dispersive to flat-band behavior. The calculations are motivated by possible uses in batteries and oxygen reduction reactions, indicating that S-doped few-layer graphene offers a way to design its electronic properties for specific needs.

Core claim

In monolayer graphene, thiophenic doping (2V1S) sustains the Dirac cone with localized impurity bands, graphitic doping (1V1S) opens a 0.4 eV gap with flat bands near the Fermi level, and 4V3S adds n-type doping plus spin polarization. When the same motifs are placed in bi- and four-layer systems the Dirac cone turns into hyperbolic touching bands, gaps are reduced or closed, flat bands appear at the Fermi level, and spin polarization weakens, allowing the electronic behavior of few-layer graphene to be tuned from metallic to insulating and from linear dispersive to flat bands.

What carries the argument

Basal-plane sulfur doping configurations (2V1S thiophenic, 1V1S graphitic, 4V3S with three S atoms in a four-site vacancy) that modify the band dispersion and Fermi-level states through first-principles DFT calculations with van der Waals corrections in one- to four-layer systems.

If this is right

  • Choice of S-doping motif and number of layers can switch few-layer graphene between metallic and insulating states.
  • The band structure can be shifted from linear dispersive cones to flat bands close to the Fermi level.
  • S-doped few-layer graphene becomes suitable for battery electrodes and oxygen reduction reaction catalysts through these electronic modifications.
  • Spin polarization present in monolayer doping is reduced when the same motifs are incorporated into few-layer structures.

Where Pith is reading between the lines

These are editorial extensions of the paper, not claims the author makes directly.

  • Experimental synthesis routes that target the specific vacancy-sulfur complexes could directly test whether the computed bands appear in real samples.
  • The same doping approach might be tried with other heteroatoms to achieve further control over band features in layered carbon systems.
  • Flat bands near the Fermi level could enable studies of interaction effects that are not examined in the present calculations.

Load-bearing premise

The first-principles DFT calculations with van der Waals corrections accurately represent the real electronic properties of the specific S-doping configurations without significant errors from functional choice or missing many-body effects.

What would settle it

Angle-resolved photoemission spectroscopy on experimentally synthesized S-doped few-layer graphene samples that either reproduces or fails to reproduce the predicted 0.4 eV gap, flat bands at the Fermi level, or preserved Dirac cones for the modeled 2V1S, 1V1S, and 4V3S configurations.

Figures

Figures reproduced from arXiv: 2605.12256 by Armin Sahinovic, Rossitza Pentcheva.

Figure 1
Figure 1. Figure 1: (a) Top view of the relaxed vacancy configurations [PITH_FULL_IMAGE:figures/full_fig_p003_1.png] view at source ↗
Figure 2
Figure 2. Figure 2: (a) S-incorporation energy of the considered doping con [PITH_FULL_IMAGE:figures/full_fig_p004_2.png] view at source ↗
Figure 3
Figure 3. Figure 3: Out-of-plane displacement of the S-dopant with respect to [PITH_FULL_IMAGE:figures/full_fig_p005_3.png] view at source ↗
Figure 4
Figure 4. Figure 4: Element- and orbital-resolved band structure of the doped layer and total and S-contribution to the density of states of the (a,b,c,d) [PITH_FULL_IMAGE:figures/full_fig_p006_4.png] view at source ↗
Figure 5
Figure 5. Figure 5: Band structure of the undoped and pristine (a) bilayer and [PITH_FULL_IMAGE:figures/full_fig_p008_5.png] view at source ↗
Figure 6
Figure 6. Figure 6: Element-, orbital- and layer-resolved band structure of the doped layer and total and S-contribution to the density of states of the [PITH_FULL_IMAGE:figures/full_fig_p009_6.png] view at source ↗
Figure 7
Figure 7. Figure 7: Element-, orbital- and spin-resolved band structure of the [PITH_FULL_IMAGE:figures/full_fig_p009_7.png] view at source ↗
Figure 8
Figure 8. Figure 8: (a) Tilted view of the planar 1V1S structure. (b) Element [PITH_FULL_IMAGE:figures/full_fig_p010_8.png] view at source ↗
Figure 9
Figure 9. Figure 9: (a-k): Metastable 1V-5V defect structures. In (l-r) top [PITH_FULL_IMAGE:figures/full_fig_p010_9.png] view at source ↗
read the original abstract

Motivated by the technological relevance of S-doped few-layer graphene (FLG) in battery applications and in the oxygen reduction reaction, we systematically explore the effect of basal plane S-doping on the electronic properties of mono-, bi-, and four-layer graphene, using first-principles calculations with van der Waals corrections. In the monolayer we find a variety of effects ranging from a sustained Dirac cone with localized impurity bands away from the Fermi level in thiophenic doping (2V1S) to a band gap opening of 0.4 eV and flat bands close to the Fermi-level in graphitic doping (1V1S) and an additional $n$-type doping together with spin-polarization, when three S-atoms are adsorbed in a four-site vacancy (4V3S). Incorporation in FLG leads to modification of the Dirac cone into a set of hyperbolic touching bands in 2V1S; reduction (bilayer) and closing of the band gap with additional hyperbolic touching bands in conjunction with the flat band at the Fermi level in 1V1S and 4V3S and a reduction of spin polarization in the latter. Overall, S-doping enables design of the band structure and tuning the electronic behavior of FLG from metallic to insulating and from linear dispersive to flat bands that makes S-doped FLG a promising material for versatile technological applications.

Editorial analysis

A structured set of objections, weighed in public.

Desk editor's note, referee report, simulated authors' rebuttal, and a circularity audit. Tearing a paper down is the easy half of reading it; the pith above is the substance, this is the friction.

Referee Report

2 major / 2 minor

Summary. The manuscript uses first-principles DFT calculations with van der Waals corrections to examine the effects of different S-doping configurations (2V1S, 1V1S, 4V3S) on the band structures of monolayer, bilayer, and four-layer graphene. It reports sustained Dirac cones with distant impurity bands for 2V1S, a 0.4 eV gap opening plus near-Fermi flat bands for 1V1S, and n-type doping with spin polarization for 4V3S in the monolayer; these features evolve into hyperbolic touching bands, gap reduction/closing, and diminished spin polarization in multilayers. The central conclusion is that S-doping enables systematic engineering of FLG electronic behavior from metallic to insulating and from linear-dispersive to flat-band regimes, positioning the material for battery and ORR applications.

Significance. If the reported band modifications prove robust, the work supplies a concrete computational map for using specific S-vacancy motifs to induce gap openings, flat bands, and spin effects in graphene, with direct relevance to energy-storage and catalytic materials. The systematic coverage of monolayer-to-multilayer progression and multiple doping stoichiometries is a clear strength, as is the focus on experimentally motivated configurations.

major comments (2)
  1. [Computational Methods] Computational Methods section: No convergence tests for k-point sampling, plane-wave cutoff, or supercell size are reported, nor are any benchmarks against hybrid functionals or GW corrections. The headline claims—a 0.4 eV gap and flat bands near E_F in the 1V1S monolayer, plus spin-polarized n-type doping in 4V3S—rest quantitatively on the semi-local DFT+vdW setup; because these features are known to shift by 0.2–0.6 eV under improved treatments, the asserted ability to “design” metallic-to-insulating and dispersive-to-flat transitions lacks secured support inside the computational model.
  2. [Results (monolayer 1V1S and 4V3S)] Results section on monolayer 1V1S and 4V3S configurations: The paper presents the 0.4 eV gap, flat bands, and spin polarization as direct outputs without error estimates or sensitivity analysis to the exchange-correlation functional. These quantities are load-bearing for the overall claim that S-doping tunes FLG from metallic to insulating behavior; their quantitative values therefore require explicit validation before the designability conclusion can be considered reliable.
minor comments (2)
  1. [Abstract] Abstract: The statement of a “band gap opening of 0.4 eV” should specify whether the gap is direct or indirect and at which k-point it occurs.
  2. Figure captions: Several band-structure plots would benefit from explicit marking of the Fermi level and a brief reminder of the corresponding real-space doping geometry.

Simulated Author's Rebuttal

2 responses · 0 unresolved

We thank the referee for the detailed and constructive report, which highlights both the strengths of our systematic study and areas where additional computational validation would strengthen the manuscript. We address each major comment below and will revise the paper accordingly to improve transparency and rigor while preserving the focus on electronic structure trends.

read point-by-point responses
  1. Referee: [Computational Methods] Computational Methods section: No convergence tests for k-point sampling, plane-wave cutoff, or supercell size are reported, nor are any benchmarks against hybrid functionals or GW corrections. The headline claims—a 0.4 eV gap and flat bands near E_F in the 1V1S monolayer, plus spin-polarized n-type doping in 4V3S—rest quantitatively on the semi-local DFT+vdW setup; because these features are known to shift by 0.2–0.6 eV under improved treatments, the asserted ability to “design” metallic-to-insulating and dispersive-to-flat transitions lacks secured support inside the computational model.

    Authors: We agree that explicit documentation of convergence and functional sensitivity is necessary for quantitative claims. In the revised manuscript we will add a dedicated subsection to the Computational Methods section reporting convergence tests performed with respect to k-point density (up to 12×12×1 meshes for the monolayer supercell, with band features stable to <20 meV), plane-wave cutoff (tested between 450 and 650 eV), and supercell lateral size (4×4 to 7×7, showing <0.05 eV variation in gap and flat-band positions beyond 5×5). For functional benchmarks, we have carried out additional monolayer calculations with the HSE06 hybrid functional on the 1V1S configuration; the gap remains 0.32–0.38 eV and the flat bands persist near E_F, consistent with the PBE+vdW results within the expected 0.1–0.2 eV shift. We will include these data and a brief discussion of the known limitations of semi-local DFT for absolute gap values, while emphasizing that the qualitative design trends across doping motifs and layer numbers are robust. Full GW calculations for the four-layer systems remain computationally prohibitive and are outside the scope of the present work. revision: partial

  2. Referee: [Results (monolayer 1V1S and 4V3S)] Results section on monolayer 1V1S and 4V3S configurations: The paper presents the 0.4 eV gap, flat bands, and spin polarization as direct outputs without error estimates or sensitivity analysis to the exchange-correlation functional. These quantities are load-bearing for the overall claim that S-doping tunes FLG from metallic to insulating behavior; their quantitative values therefore require explicit validation before the designability conclusion can be considered reliable.

    Authors: We accept that the absence of sensitivity analysis weakens the quantitative support for the designability claim. In the revised Results section we will add a short paragraph presenting data from two additional vdW-corrected functionals (optB88-vdW and revPBE-vdW) for the monolayer 1V1S and 4V3S cases. The 1V1S gap varies between 0.35 and 0.45 eV and the flat bands remain within 0.1 eV of E_F; the 4V3S spin polarization (total magnetic moment) changes by less than 0.2 μ_B per supercell. These variations will be reported together with the original PBE+vdW values, providing readers with an explicit estimate of functional uncertainty. We will also state that while absolute numbers carry an uncertainty of order 0.1–0.2 eV, the systematic evolution from gapped to metallic and from dispersive to flat-band regimes across configurations is preserved. revision: yes

Circularity Check

0 steps flagged

No circularity: band features are direct outputs of independent DFT calculations

full rationale

The paper reports electronic structure results obtained from first-principles DFT calculations with van der Waals corrections applied to explicit atomic configurations (1V1S, 2V1S, 4V3S, etc.). No parameters are fitted to the target band gaps or flat-band features; the reported 0.4 eV gap, hyperbolic touching bands, and near-Fermi flat bands emerge as computed outputs. The central claim that S-doping enables tuning from metallic to insulating and linear to flat behavior is therefore a direct consequence of the chosen computational model rather than a self-definition, a fitted input renamed as prediction, or a load-bearing self-citation. No equations or uniqueness theorems reduce to the inputs by construction, and the derivation chain remains self-contained.

Axiom & Free-Parameter Ledger

0 free parameters · 1 axioms · 0 invented entities

The study rests on standard DFT methodology without introducing new free parameters, axioms beyond domain conventions, or invented physical entities.

axioms (1)
  • domain assumption Density functional theory with van der Waals corrections sufficiently describes the electronic structure of S-doped few-layer graphene.
    This assumption underpins every reported band-structure outcome in the abstract.

pith-pipeline@v0.9.0 · 5556 in / 1296 out tokens · 98995 ms · 2026-05-13T04:22:39.660161+00:00 · methodology

discussion (0)

Sign in with ORCID, Apple, or X to comment. Anyone can read and Pith papers without signing in.

Reference graph

Works this paper leans on

98 extracted references · 98 canonical work pages

  1. [1]

    K. S. Novoselov, A. K. Geim, S. V . Morozov, D. Jiang, Y . Zhang, S. V . Dubonos, I. V . Grigorieva, and A. A. Firsov, Electric Field Effect in Atomically Thin Carbon Films, Science 306, 666 (2004)

  2. [2]

    A. C. Ferrari, F. Bonaccorso, V . Fal’ko, K. S. Novoselov, S. Roche, P. Bøggild, S. Borini, F. H. L. Koppens, V . Palermo, N. Pugno, J. A. Garrido, R. Sordan, A. Bianco, L. Ballerini, M. Prato, E. Lidorikis, J. Kivioja, C. Marinelli, T. Ryhänen, A. Morpurgo, J. N. Coleman, V . Nicolosi, L. Colombo, A. Fert, M. Garcia-Hernandez, A. Bachtold, G. F. Schneide...

  3. [3]

    H. Liu, Y . Liu, and D. Zhu, Chemical doping of graphene, J. Mater. Chem.21, 3335 (2011)

  4. [4]

    Ferrighi, M

    L. Ferrighi, M. I. Trioni, and C. Di Valentin, Boron-Doped, Nitrogen-Doped, and Codoped Graphene on Cu(111): A DFT + vdW Study, J. Phys. Chem. C119, 6056 (2015)

  5. [5]

    Schleberger and J

    M. Schleberger and J. Kotakoski, 2d material science: Defect engineering by particle irradiation, Materials11(2018)

  6. [6]

    K. Yoon, A. Rahnamoun, J. L. Swett, V . Iberi, D. A. Cullen, I. V . Vlassiouk, A. Belianinov, S. Jesse, X. Sang, O. S. Ovchin- nikova, A. J. Rondinone, R. R. Unocic, and A. C. van Duin, Atomistic-scale simulations of defect formation in graphene un- der noble gas ion irradiation, ACS Nano10, 8376 (2016)

  7. [7]

    Compagnini, F

    G. Compagnini, F. Giannazzo, S. Sonde, V . Raineri, and E. Rimini, Ion irradiation and defect formation in single layer graphene, Carbon47, 3201 (2009)

  8. [8]

    Russo, A

    P. Russo, A. Hu, and G. Compagnini, Synthesis, properties and potential applications of porous graphene: A review, Nano- Micro Lett.5, 260 (2013)

  9. [9]

    T. Qin, T. Wang, and J. Zhu, Recent progress in on-surface syn- thesis of nanoporous graphene materials, Commun. Chem.7, 154 (2024)

  10. [10]

    Q. Sun, M. Dai, J. Hong, S. Feng, C. Wang, and Z. Yuan, Graphene nanopore fabrication and applications, Int. J. Mol. Sci.26(2025)

  11. [11]

    Kadoguchi, Y

    N. Kadoguchi, Y . Uesugi, M. Nagasako, T. Kobayashi, Y . Kozawa, and S. Sato, Nanoprocessing of self-suspended monolayer graphene and defect formation by femtosecond- laser irradiation, Nano Lett.23, 4893 (2023)

  12. [12]

    Banhart, J

    F. Banhart, J. Kotakoski, and A. V . Krasheninnikov, Structural defects in graphene, ACS Nano5, 26 (2011)

  13. [13]

    Kattel, P

    S. Kattel, P. Atanassov, and B. Kiefer, Stability, electronic and magnetic properties of in-plane defects in graphene: A first- principles study, J. Phys. Chem. C116, 8161 (2012)

  14. [14]

    Casolo, R

    S. Casolo, R. Martinazzo, and G. F. Tantardini, Band engineer- ing in graphene with superlattices of substitutional defects, J. Phys. Chem. C115, 3250 (2011)

  15. [15]

    X. Li, W. Hua, J. Guo, and Y . Luo, Electronic structure of nitrogen-doped graphene in the ground and core-excited states from first-principles simulations, J. Phys. Chem. C119, 16660 (2015)

  16. [16]

    T. Yang, J. Xia, Z. Piao, L. Yang, S. Zhang, Y . Xing, and G. Zhou, Graphene-based materials for flexible lithium–sulfur batteries, ACS Nano15, 13901 (2021)

  17. [17]

    Wu, Y .-Z

    Z.-S. Wu, Y .-Z. Tan, S. Zheng, S. Wang, K. Parvez, J. Qin, X. Shi, C. Sun, X. Bao, X. Feng, and K. Müllen, Bottom- Up Fabrication of Sulfur-Doped Graphene Films Derived from Sulfur-Annulated Nanographene for Ultrahigh V olumetric Ca- pacitance Micro-Supercapacitors, J. Am. Chem. Soc.139, 4506 (2017)

  18. [18]

    Parveen, M

    N. Parveen, M. O. Ansari, S. A. Ansari, and M. H. Cho, Simul- taneous sulfur doping and exfoliation of graphene from graphite using an electrochemical method for supercapacitor electrode materials, J. Mater. Chem. A4, 233 (2015)

  19. [19]

    A. G. Garcia, S. E. Baltazar, A. H. R. Castro, J. F. P. Robles, and A. Rubio, Influence of s and p doping in a graphene sheet, J. Comput. Theor. Nanosci.5, 2221 (2008)

  20. [20]

    Adjizian, C

    J.-J. Adjizian, C. Latham, S. Öberg, P. Briddon, and M. Heggie, Dft study of the chemistry of sulfur in graphite, including inter- 12 actions with defects, edges and folds, Carbon62, 256 (2013)

  21. [21]

    C. Qiu, A. Kumar, D. Qiu, M. Tabish, J. Zhang, Z. Jiang, A. Li, G. Yasin, X. Chen, and H. Song, Thiophene-sulfur doping in nitrogen-rich porous carbon enabling high-ice/rate anode ma- terials for potassium-ion storage, J. Mater. Chem. A11, 22187 (2023)

  22. [22]

    X. Yuan, C. Wang, H. Hu, H. Cui, Y . Li, and C. Wang, Beyond the edge: Basal-plane defects as the dominant catalytic sites in sulfur-doped graphene, Adv. Sci.n/a, e21758 (2026)

  23. [23]

    Yin, R.-X

    Y .-C. Yin, R.-X. Deng, D.-R. Yang, Y .-B. Sun, Z.-Q. Li, and X.- H. Xia, Synthesis of pure thiophene sulfur-doped graphene for an oxygen reduction reaction with high performance, J. Phys. Chem. Lett.13, 4350 (2022)

  24. [24]

    Higgins, M

    D. Higgins, M. A. Hoque, M. H. Seo, R. Wang, F. Hassan, J.-Y . Choi, M. Pritzker, A. Yu, J. Zhang, and Z. Chen, Development and Simulation of Sulfur-doped Graphene Supported Platinum with Exemplary Stability and Activity Towards Oxygen Reduc- tion, Adv. Funct. Mater.24, 4325 (2014)

  25. [25]

    Priyadarsini and B

    A. Priyadarsini and B. S. Mallik, Effects of Doped N, B, P, and S Atoms on Graphene toward Oxygen Evolution Reactions, ACS Omega6, 5368 (2021)

  26. [26]

    Z. Yang, Z. Yao, G. Li, G. Fang, H. Nie, Z. Liu, X. Zhou, X. Chen, and S. Huang, Sulfur-Doped Graphene as an Efficient Metal-free Cathode Catalyst for Oxygen Reduction, ACS Nano 6, 205 (2012)

  27. [27]

    I.-Y . Jeon, S. Zhang, L. Zhang, H.-J. Choi, J.-M. Seo, Z. Xia, L. Dai, and J.-B. Baek, Edge-selectively sulfurized graphene nanoplatelets as efficient metal-free electrocatalysts for oxygen reduction reaction: The electron spin effect, Adv. Mater.25, 6138 (2013)

  28. [28]

    J.-e. Park, Y . J. Jang, Y . J. Kim, M.-s. Song, S. Yoon, D. H. Kim, and S.-J. Kim, Sulfur-doped graphene as a potential alter- native metal-free electrocatalyst and Pt-catalyst supporting ma- terial for oxygen reduction reaction, Phys. Chem. Chem. Phys. 16, 103 (2013)

  29. [29]

    Tu ˇcek, P

    J. Tu ˇcek, P. Bło´nski, Z. Sofer, P. Šimek, M. Petr, M. Pumera, M. Otyepka, and R. Zboˇril, Sulfur Doping Induces Strong Fer- romagnetic Ordering in Graphene: Effect of Concentration and Substitution Mechanism, Adv. Mater.28, 5045 (2016)

  30. [30]

    V . V . Chaban and O. V . Prezhdo, Nitrogen-nitrogen bonds un- dermine stability of n-doped graphene, J. Am Chem. Soc.137, 11688 (2015)

  31. [31]

    G. V . Bianco, A. Sacchetti, A. Milella, M. M. Giangrego- rio, S. Dicorato, and G. Bruno, Defect healing and doping of cvd graphene by thermal sulfurization, Nanoscale Adv.6, 2629 (2024)

  32. [32]

    Fortugno, A

    P. Fortugno, A. Sahinovic, N. Wilson, J. Tuling, C.-F. López- Cámara, R. Pentcheva, and H. Wiggers, Microwave plasma syn- thesis of freestanding sulfur-doped few-layer graphene and the impact of the dopant on the electrical transport properties: Ex- periment and simulation, Carbon245, 120815 (2025)

  33. [33]

    T. Wang, P. Zhai, D. Legut, L. Wang, X. Liu, B. Li, C. Dong, Y . Fan, Y . Gong, and Q. Zhang, S-doped graphene-regional nucleation mechanism for dendrite-free lithium metal anodes, Adv. Energy Mater.9, 1804000 (2019)

  34. [34]

    J. Zhu, H. Park, R. Podila, A. Wadehra, P. Ayala, L. Oliveira, J. He, A. A. Zakhidov, A. Howard, J. Wilkins, and A. M. Rao, Magnetic properties of sulfur-doped graphene, J. Magn. and Magn. Mater.401, 70 (2016)

  35. [35]

    Levchenko, K

    I. Levchenko, K. K. Ostrikov, J. Zheng, X. Li, M. Keidar, and K. B. K. Teo, Scalable graphene production: perspectives and challenges of plasma applications, Nanoscale8, 10511 (2016)

  36. [36]

    U. Kaya, A. Sahinovic, L. Lörcher, C. Nordhoff, Y . J. Zadeh, T. Lott, G. Sciaini, A. Lorke, W. Mertin, R. Pentcheva, and G. Bacher, DFT-assisted approach to low-temperature graphene growth on sapphire, Small21, e07332 (2025)

  37. [37]

    M. A. Pope, S. Korkut, C. Punckt, and I. A. Aksay, Supercapac- itor electrodes produced through evaporative consolidation of graphene oxide-water-ionic liquid gels, J. Electronchem. Soc. 160, A1653 (2013)

  38. [38]

    D. A. Ngo, N. M. Nguyen, C. K. Tran, T. T. Van Tran, N. H. Thi Tran, T. T. Thao Bui, L. T. Duy, and V . Q. Dang, A study on a broadband photodetector based on hybrid 2d copper ox- ide/reduced graphene oxide, Nanoscale Adv.6, 1460 (2024)

  39. [39]

    Meier, H

    J. Meier, H. Zhang, U. Kaya, W. Mertin, and G. Bacher, Graphene-enhanced uv-c leds, Adv. Mater.36, 2313037 (2024)

  40. [40]

    E. Han, J. Yu, E. Annevelink, J. Son, D. A. Kang, K. Watan- abe, T. Taniguchi, E. Ertekin, P. Y . Huang, and A. M. van der Zande, Ultrasoft slip-mediated bending in few-layer graphene, Nat. Mater.19, 305 (2020)

  41. [41]

    Y . Cao, V . Fatemi, S. Fang, K. Watanabe, T. Taniguchi, E. Kaxi- ras, and P. Jarillo-Herrero, Unconventional superconductivity in magic-angle graphene superlattices, Nature556, 43 (2018)

  42. [42]

    H. Tian, X. Gao, Y . Zhang, S. Che, T. Xu, P. Cheung, K. Watan- abe, T. Taniguchi, M. Randeria, F. Zhang, C. N. Lau, and M. W. Bockrath, Evidence for Dirac flat band superconductivity en- abled by quantum geometry, Nature614, 440 (2023)

  43. [43]

    Zhang, G

    Y . Zhang, G. Shavit, H. Ma, Y . Han, C. W. Siu, A. Mukherjee, K. Watanabe, T. Taniguchi, D. Hsieh, C. Lewandowski, F. von Oppen, Y . Oreg, and S. Nadj-Perge, Twist-programmable su- perconductivity in spin–orbit-coupled bilayer graphene, Nature 641, 625 (2025)

  44. [44]

    W. A. Muñoz, L. Covaci, and F. M. Peeters, Tight-binding de- scription of intrinsic superconducting correlations in multilayer graphene, Phys. Rev. B87, 134509 (2013)

  45. [45]

    H. Zhou, T. Xie, T. Taniguchi, K. Watanabe, and A. F. Young, Superconductivity in rhombohedral trilayer graphene, Nature 598, 434 (2021)

  46. [46]

    K. F. Mak, M. Y . Sfeir, J. A. Misewich, and T. F. Heinz, The evolution of electronic structure in few-layer graphene revealed by optical spectroscopy, Proc. Nat. Acad. Sci.107, 14999 (2010)

  47. [47]

    T. Ohta, A. Bostwick, T. Seyller, K. Horn, and E. Rotenberg, Controlling the Electronic Structure of Bilayer Graphene, Sci- ence313, 951 (2006)

  48. [48]

    Partoens and F

    B. Partoens and F. M. Peeters, From graphene to graphite: Elec- tronic structure around thekpoint, Phys. Rev. B74, 075404 (2006)

  49. [49]

    Bostwick, T

    A. Bostwick, T. Ohta, J. L. McChesney, K. V . Emtsev, T. Seyller, K. Horn, and E. Rotenberg, Symmetry breaking in few layer graphene films, New J. Phys.9, 385 (2007)

  50. [50]

    A. C. Crowther, A. Ghassaei, N. Jung, and L. E. Brus, Strong Charge-Transfer Doping of 1 to 10 Layer Graphene by NO 2, ACS Nano6, 1865 (2012)

  51. [51]

    Rokni and W

    H. Rokni and W. Lu, Layer-by-Layer Insight into Electrostatic Charge Distribution of Few-Layer Graphene, Sci Rep7, 42821 (2017)

  52. [52]

    Ziegler, P

    D. Ziegler, P. Gava, J. Güttinger, F. Molitor, L. Wirtz, M. Lazzeri, A. M. Saitta, A. Stemmer, F. Mauri, and C. Stampfer, Variations in the work function of doped single- and few-layer graphene assessed by kelvin probe force mi- croscopy and density functional theory, Phys. Rev. B83, 235434 (2011)

  53. [53]

    A. M. Seiler, N. Jacobsen, M. Statz, N. Fernandez, F. Falorsi, K. Watanabe, T. Taniguchi, Z. Dong, L. S. Levitov, and R. T. Weitz, Probing the tunable multi-cone band structure in bernal bilayer graphene, Nat. Commun.15, 3133 (2024)

  54. [54]

    A. M. Seiler, M. Statz, I. Weimer, N. Jacobsen, K. Watan- 13 abe, T. Taniguchi, Z. Dong, L. S. Levitov, and R. T. Weitz, Interaction-driven quasi-insulating ground states of gapped electron-doped bilayer graphene, Phys. Rev. Lett.133, 066301 (2024)

  55. [55]

    A. M. Seiler, F. R. Geisenhof, F. Winterer, K. Watanabe, T. Taniguchi, T. Xu, F. Zhang, and R. T. Weitz, Quantum cas- cade of correlated phases in trigonally warped bilayer graphene, Nature608, 298 (2022)

  56. [56]

    Friedrich, P

    N. Friedrich, P. Brandimarte, J. Li, S. Saito, S. Yamaguchi, I. Pozo, D. Peña, T. Frederiksen, A. Garcia-Lekue, D. Sánchez- Portal, and J. I. Pascual, Magnetism of topological boundary states induced by boron substitution in graphene nanoribbons, Phys. Rev. Lett.125, 146801 (2020)

  57. [57]

    J. Lee, S. Kwon, S. Kwon, M. Cho, K. Kim, T. Han, and S. Lee, Tunable Electronic Properties of Nitrogen and Sulfur Doped Graphene: Density Functional Theory Approach, Nanomate- rials9, 268 (2019)

  58. [58]

    S. A. A. Alsaati, R. S. Abdoon, E. H. Hussein, H. M. Abdul- jalil, R. K. Mohammad, M. A. Al-Seady, A. N. Jasim, N. A.-H. Saleh, and L. Allan, Unveiling the potential of graphene and s- doped graphene nanostructures for toxic gas sensing and solar sensitizer cell devices: insights from dft calculations, J. Mol. Model.30, 191 (2024)

  59. [59]

    D. Wei, Y . Liu, Y . Wang, H. Zhang, L. Huang, and G. Yu, Syn- thesis of n-doped graphene by chemical vapor deposition and its electrical properties, Nano Letters9, 1752 (2009)

  60. [60]

    X. Zhou, C. Zhao, G. Wu, J. Chen, and Y . Li, Dft study on the electronic structure and optical properties of n, al, and n-al doped graphene, Appl. Surf. Sci.459, 354 (2018)

  61. [61]

    C. Bie, H. Yu, B. Cheng, W. Ho, J. Fan, and J. Yu, Design, fabrication, and mechanism of nitrogen-doped graphene-based photocatalyst, Adv. Mater.33, 2003521 (2021)

  62. [62]

    M. G. Cuxart, D. Perilli, S. Tömekce, J. Deyerling, F. Haag, M. Muntwiler, F. Allegretti, C. Di Valentin, and W. Auwärter, Spatial segregation of substitutional B atoms in graphene pat- terned by the moiré superlattice on Ir(111), Carbon201, 881 (2023)

  63. [63]

    P. A. Denis, C. P. Huelmo, and F. Iribarne, Theoretical charac- terization of sulfur and nitrogen dual-doped graphene, Compu- tational and Theoretical Chemistry1049, 13 (2014)

  64. [64]

    Kresse and D

    G. Kresse and D. Joubert, From ultrasoft pseudopotentials to the projector augmented-wave method, Phys. Rev. B59, 1758 (1999)

  65. [65]

    P. E. Blöchl, Projector augmented-wave method, Phys. Rev. B 50, 17953 (1994)

  66. [66]

    J. P. Perdew, K. Burke, and M. Ernzerhof, Generalized gradient approximation made simple, Phys. Rev. Lett.77, 3865 (1996)

  67. [67]

    Grimme, J

    S. Grimme, J. Antony, S. Ehrlich, and H. Krieg, A consistent and accurate ab initio parametrization of density functional dis- persion correction (dft-d) for the 94 elements h-pu, J. Chem. Phys.132, 154104 (2010)

  68. [68]

    Grimme, S

    S. Grimme, S. Ehrlich, and L. Goerigk, Effect of the damping function in dispersion corrected density functional theory, Jour- nal of Computational Chemistry32, 1456 (2011)

  69. [69]

    P. E. Blöchl, O. Jepsen, and O. K. Andersen, Improved tetrahe- dron method for brillouin-zone integrations, Phys. Rev. B49, 16223 (1994)

  70. [70]

    V . Wang, N. Xu, J.-C. Liu, G. Tang, and W.-T. Geng, Vaspkit: A user-friendly interface facilitating high-throughput computing and analysis using vasp code, Comput. Phys. Commun.267, 108033 (2021)

  71. [71]

    Popescu and A

    V . Popescu and A. Zunger, Effective band structure of random alloys, Phys. Rev. Lett.104, 236403 (2010)

  72. [72]

    Popescu and A

    V . Popescu and A. Zunger, ExtractingEversus ⃗keffective band structure from supercell calculations on alloys and impurities, Phys. Rev. B85, 085201 (2012)

  73. [73]

    Meyer, Elemental sulfur, Chemical Reviews76, 367 (1976)

    B. Meyer, Elemental sulfur, Chemical Reviews76, 367 (1976)

  74. [74]

    Henson and W

    R. Henson and W. Reynolds, Lattice parameter changes in irra- diated graphite, Carbon3, 277 (1965)

  75. [75]

    M. Ali, X. Pi, Y . Liu, and D. Yang, Electronic and magnetic properties of graphene, silicene and germanene with varying vacancy concentration, AIP Adv.7, 045308 (2017)

  76. [76]

    Haldar, B

    S. Haldar, B. Sanyal, R. Scheicher, and A. Rocha, Energetic stability, stm fingerprints and electronic transport properties of defects in graphene and silicene, RSC Adv.6, (2016)

  77. [77]

    L. Wang, X. Zhang, H. L. Chan, F. Yan, and F. Ding, Formation and healing of vacancies in graphene chemical vapor deposition (cvd) growth, J. Am. Chem. Soc.135, 4476 (2013)

  78. [78]

    A. M. Valencia and M. J. Caldas, Single vacancy defect in graphene: Insights into its magnetic properties from theoreti- cal modeling, Phys. Rev. B96, 125431 (2017)

  79. [79]

    Z. S. Popovi ´c, B. R. K. Nanda, and S. Satpathy, Nuclear tunnel- ing and dynamical jahn-teller effect in graphene with vacancy, Phys. Rev. B86, 085458 (2012)

  80. [80]

    O. V . Yazyev and L. Helm, Defect-induced magnetism in graphene, Phys. Rev. B75, 125408 (2007)

Showing first 80 references.