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Paper Citation Record · LEDGER

Optimizing CMOS-compatible, superconducting titanium nitride resonators: Deposition conditions and structuring processes

As of 11 August 2026, this Paper Citation Record lists 5 of 5 outbound references and 1 inbound Pith citation observation for arXiv:2603.00441.

A citation records a reference. It does not transfer a finding from one paper to another.

pith.paper-citation-record.v1
2603.00441 v2

Coverage vector

measured 5 of 5 reference resolution

Typed states for the displayed outbound observations.

Source: paper_references, paper_reference_links, observed 2026-08-02T19:57:23.280771Z

measured 6 of 6 standing notices

One-hop event checks from named stored sources.

Source: scholarly_work_events, retraction_status_cache, observed 2026-08-11T06:34:44.6726+00:00

measured 1 of 1 inbound itemization

Pith citing papers itemized under the disclosed page cap.

Source: paper_references, paper_reference_links, observed 2026-08-01T05:13:26.449826Z

measured 1 of 1 external citation measurements

A source-named dated measurement, never combined with another source.

Source: pith, observed 2026-08-05T02:28:24.338817Z

Reference resolution

5 of 5 outbound references displayed

  • verified exact0
  • verified fuzzy0
  • unresolved4
  • parse uncertain0
  • malformed identifier1
  • metadata mismatch0

External citation measurements

0
pith, observed 2026-08-05T02:28:24.338817Z

Outbound references

Observation 7b7bebb6-b0b0-4ee0-b237-32965153173a · outbound

This paper cites The resulting twelve wafers are characterized using sheet resistance measurements to deter- mine the uniformity and the reproducibility of the process.

Optimizing CMOS-compatible, superconducting titanium nitride resonators: Deposition conditions and structuring processes The resulting twelve wafers are characterized using sheet resistance measurements to deter- mine the uniformity and the reproducibility of the process

Reference 1

Resolution
unresolved
no resolver link, observed 2026-08-02T19:57:22.923742Z

Source-reported events for the cited work

Unavailable: canonical work link unavailable.

source=pdf_text observed=2026-08-02T19:57:22.923742Z digest=sha256:098239c17052da17c2a1e59a41faae2ce0a76c85c509a591257ad567438b6835

Observation fd4cbbb7-6364-4bc3-ae67-abb494043298 · outbound

This paper cites The influence of the strip process (here the HT strip) is not visible in the SEM images; its microscopic effects will be discussed below.

Optimizing CMOS-compatible, superconducting titanium nitride resonators: Deposition conditions and structuring processes The influence of the strip process (here the HT strip) is not visible in the SEM images; its microscopic effects will be discussed below

Reference 2

Resolution
unresolved
no resolver link, observed 2026-08-02T19:57:23.005426Z

Source-reported events for the cited work

Unavailable: canonical work link unavailable.

source=pdf_text observed=2026-08-02T19:57:23.005426Z digest=sha256:43bcf8de4b7140091769b3f67359a8bc34d43b2fb9b318758d9af4f94d436e37

Observation c8d72923-8932-4b0c-b15a-0789641e64aa · outbound

This paper cites Figure 7 sum- marizes the first two of these three parameters.

Optimizing CMOS-compatible, superconducting titanium nitride resonators: Deposition conditions and structuring processes Figure 7 sum- marizes the first two of these three parameters

Reference 3

Resolution
unresolved
no resolver link, observed 2026-08-02T19:57:23.057842Z

Source-reported events for the cited work

Unavailable: canonical work link unavailable.

source=pdf_text observed=2026-08-02T19:57:23.057842Z digest=sha256:901f6cb49171962f5107e340d038b2d98cfc7132ac9680962265219995268d21

Observation 6d32fd0f-e3e3-4825-9922-f92841aeb92e · outbound

This paper cites For this purpose, Figure 9 summarizesδ TLS for all four process combinations derived from pairing LP and HP etching with LT and HT resist stripping.

Optimizing CMOS-compatible, superconducting titanium nitride resonators: Deposition conditions and structuring processes For this purpose, Figure 9 summarizesδ TLS for all four process combinations derived from pairing LP and HP etching with LT and HT resist stripping

Reference 4

Resolution
malformed identifier
no resolver link, observed 2026-08-02T19:57:23.101061Z

Source-reported events for the cited work

Unavailable: canonical work link unavailable.

source=pdf_text observed=2026-08-02T19:57:23.101061Z digest=sha256:3bcb8bffd8e9c82951211c7560a17603e87ad07026b019866645fc196d5192ea

Observation b2ccaf23-bfde-44b5-bd86-a2c8bb93192b · outbound

This paper cites Sputtered TiN films for superconducting coplanar waveguide resonators.

Optimizing CMOS-compatible, superconducting titanium nitride resonators: Deposition conditions and structuring processes Sputtered TiN films for superconducting coplanar waveguide resonators

Reference 5

Resolution
unresolved
no resolver link, observed 2026-08-02T19:57:23.280771Z

Source-reported events for the cited work

Unavailable: canonical work link unavailable.

source=pdf_text observed=2026-08-02T19:57:23.280771Z digest=sha256:9024d8dda2004c9a1aa111452b73b447e29b2a5e8e632668b93c2592f6ddcc60

Pith citing papers

Observation fa43b44f-19c9-4cd4-a18c-41e13eb708cd · inbound

Substrate-metal interface engineering enhances TaN/Ta thin film superconducting resonator performance cites this paper.

Substrate-metal interface engineering enhances TaN/Ta thin film superconducting resonator performance Optimizing CMOS-compatible, superconducting titanium nitride resonators: Deposition conditions and structuring processes

Reference 17

Resolution
verified exact
local_arxiv, observed 2026-08-01T05:18:36.078818Z

Source-reported events for the cited work

No event found in the named queried sources as of 2026-08-11T06:34:44.6726+00:00.

source=pdf_text observed=2026-08-01T05:13:26.449826Z digest=sha256:cdf6f5e18559961f69c2bfbb23cab69a4f03e9b5dfffbfd633d01542c0e437c1