pith:4FA7XG4N
New Source of Spin-hot spot in displaced silicon double quantum dots
Displaced silicon double quantum dots produce a new low-field spin-hot spot with spin relaxation rates four orders of magnitude lower than conventional high-field spots.
arxiv:2605.16947 v1 · 2026-05-16 · cond-mat.mes-hall
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Claims
When quantum dots are separated by about 60 nm, calculations predict oscillations in spin-hot spots as the in-plane magnetic field changes. These unusual spin-hot spot oscillations occur at low magnetic fields (<1T), resulting in spin-relaxation rates about four orders of magnitude lower than those of conventional high-field spin-hot spots (≈ 4.5T). The extremely low spin-relaxation rate at the spin-hot spot enables the preparation of qubit superposition states for quantum computing and information processing.
The dominant spin-relaxation channel is the deformation-potential coupling to acoustic phonons and that the model of two displaced, magnetically confined dots accurately captures all relevant level crossings without additional relaxation mechanisms such as interface roughness or charge noise.
Numerical modeling of phonon-induced spin relaxation in displaced silicon double quantum dots reveals a new low-field spin-hot spot with relaxation rates four orders of magnitude lower than standard high-field ones when dots are separated by ~60 nm.
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| First computed | 2026-05-20T00:03:32.336881Z |
|---|---|
| Builder | pith-number-builder-2026-05-17-v1 |
| Signature | Pith Ed25519
(pith-v1-2026-05) · public key |
| Schema | pith-number/v1.0 |
Canonical hash
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Canonical record JSON
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