A graph attention-based virtual metrology framework predicts film thickness from sensor traces by representing step-parameter pairs as nodes and using attention to capture parameter-to-layer dependencies.
AI-Powered Next-Generation Technology for Semiconductor Optical Metrology: A Review
1 Pith paper cite this work. Polarity classification is still indexing.
1
Pith paper citing it
fields
cs.CE 1years
2026 1verdicts
UNVERDICTED 1representative citing papers
citing papers explorer
-
Graph Attention-Based Virtual Metrology for Film Deposition Processes in Semiconductor Manufacturing
A graph attention-based virtual metrology framework predicts film thickness from sensor traces by representing step-parameter pairs as nodes and using attention to capture parameter-to-layer dependencies.