Plasma etch recipe produces photonic-grade diamond-on-insulator films from bonded SCD membranes and enables 5 nm resolution thickness mapping via colorimetry on standard microscope images.
Umezawa, Diamond semiconductor devices for harsh environmental applications, in: 2022 6th IEEE Elec- tron Devices Technology & Manufacturing Conference 17 (EDTM), 2022, pp
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Plasma Etch Process Optimization for Photonic-Grade Diamond-on-Insulator Substrates and Thickness Evaluation using Colorimetry
Plasma etch recipe produces photonic-grade diamond-on-insulator films from bonded SCD membranes and enables 5 nm resolution thickness mapping via colorimetry on standard microscope images.