An on-chip SiO2/Si3N4 stencil lithography mask enables shadow evaporation of Al Josephson junctions, demonstrated with transmon qubits achieving average T1 of 75 μs.
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Empirical scaling across materials reveals a universal bound on microwave dissipation tied to superfluid density and attributed to trapped nonequilibrium quasiparticles.
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On-chip stencil lithography for superconducting qubits
An on-chip SiO2/Si3N4 stencil lithography mask enables shadow evaporation of Al Josephson junctions, demonstrated with transmon qubits achieving average T1 of 75 μs.