Plasma etch recipe produces photonic-grade diamond-on-insulator films from bonded SCD membranes and enables 5 nm resolution thickness mapping via colorimetry on standard microscope images.
Nucleation of diamond films on heterogeneous substrates: a review
2 Pith papers cite this work. Polarity classification is still indexing.
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CVD-grown nanodiamonds of ~60 nm achieve mean T1 spin relaxation times of 800 μs with maxima over 1.8 ms, nearly ten times longer than commercial nanodiamonds in the 50-150 nm range.
citing papers explorer
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Plasma Etch Process Optimization for Photonic-Grade Diamond-on-Insulator Substrates and Thickness Evaluation using Colorimetry
Plasma etch recipe produces photonic-grade diamond-on-insulator films from bonded SCD membranes and enables 5 nm resolution thickness mapping via colorimetry on standard microscope images.
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Long Spin Relaxation Times in CVD-Grown Nanodiamonds
CVD-grown nanodiamonds of ~60 nm achieve mean T1 spin relaxation times of 800 μs with maxima over 1.8 ms, nearly ten times longer than commercial nanodiamonds in the 50-150 nm range.