pith. machine review for the scientific record. sign in

arxiv: 2604.14443 · v1 · submitted 2026-04-15 · ❄️ cond-mat.mtrl-sci · physics.ins-det· physics.optics

Recognition: unknown

Ultra-high-vacuum cluster tool for epitaxial synthesis and optical spectroscopy of reactive 2D materials

M. Dembecki , J. Schabesberger , M. Bissolo , A. Thurn , A. Ulhe , P. Avdienko , J. Ulrichs , H. Riedl
show 3 more authors
G. Koblm\"uller E. Zallo J.J. Finley
Authors on Pith no claims yet

Pith reviewed 2026-05-10 12:30 UTC · model grok-4.3

classification ❄️ cond-mat.mtrl-sci physics.ins-detphysics.optics
keywords 2D materialsultra-high vacuummolecular beam epitaxyphotoluminescenceRaman spectroscopycluster toolin-situ characterization
0
0 comments X

The pith

A single ultra-high-vacuum cluster tool grows reactive 2D materials by molecular beam epitaxy and performs their low-temperature optical spectroscopy without air exposure.

A machine-rendered reading of the paper's core claim, the machinery that carries it, and where it could break.

The paper introduces an integrated ultra-high-vacuum cluster that links molecular beam epitaxy growth directly to an optical spectroscopy chamber. This design keeps air-sensitive two-dimensional semiconductors in their as-grown state for photoluminescence and Raman measurements at temperatures from 20 K to 300 K. The optical section scans entire wafers at micrometer resolution and includes a deconvolution step that restores spatial detail despite cryostat vibrations, using a measured point-spread function. Performance is shown on post-transition metal monochalcogenides, confirming long-term sample preservation and reproducible data.

Core claim

The optical chamber of the ultra-high-vacuum cluster tool provides micrometer-scale spatial resolution, temperature control from 20-300 K with a closed-cycle cryostat, long-term preservation of as-grown samples, and a deconvolution algorithm that recovers spatial information under vibration using a system-specific point-spread function, as demonstrated on post-transition metal monochalcogenides.

What carries the argument

Ultra-high-vacuum cluster integrating molecular beam epitaxy growth with an optical spectroscopy chamber that uses a closed-cycle cryostat and a deconvolution algorithm based on the measured point-spread function.

If this is right

  • Growth parameters can be adjusted in real time using immediate optical feedback on the pristine material.
  • Uniformity across full wafers can be mapped without removing samples from vacuum.
  • Structural and optoelectronic properties become measurable in the exact state delivered by epitaxy.
  • Long-term sample storage under vacuum enables repeated measurements on the same wafer over days.

Where Pith is reading between the lines

These are editorial extensions of the paper, not claims the author makes directly.

  • The same vibration-correction approach could be applied to other scanning optical instruments that operate near mechanical cryocoolers.
  • Combining this cluster with additional in-situ probes such as electron diffraction would create a more complete growth-to-analysis workflow for air-unstable layers.
  • Data collected this way could serve as a reference standard for comparing ex-situ measurements that inevitably include some surface degradation.

Load-bearing premise

Performance shown on post-transition metal monochalcogenides will hold for other reactive 2D materials without introducing measurement artifacts from the setup itself.

What would settle it

Optical spectra collected in situ on a different known air-sensitive 2D material that differ from literature values obtained under strictly inert conditions would indicate setup-induced changes.

Figures

Figures reproduced from arXiv: 2604.14443 by A. Thurn, A. Ulhe, E. Zallo, G. Koblm\"uller, H. Riedl, J.J. Finley, J. Schabesberger, J. Ulrichs, M. Bissolo, M. Dembecki, P. Avdienko.

Figure 1
Figure 1. Figure 1: FIG. 1: CAD rendered model of the full cluster. The cluster co [PITH_FULL_IMAGE:figures/full_fig_p002_1.png] view at source ↗
Figure 2
Figure 2. Figure 2: FIG. 2: Vibration frequency spectrum before and after [PITH_FULL_IMAGE:figures/full_fig_p003_2.png] view at source ↗
Figure 3
Figure 3. Figure 3: FIG. 3: a) Geometric optics sketch of the employed [PITH_FULL_IMAGE:figures/full_fig_p004_3.png] view at source ↗
Figure 4
Figure 4. Figure 4: FIG. 4: Waterfall plot of Raman spectra across an as-grown [PITH_FULL_IMAGE:figures/full_fig_p004_4.png] view at source ↗
Figure 5
Figure 5. Figure 5: FIG. 5: Enlarged schematic of the cryostat and its attached [PITH_FULL_IMAGE:figures/full_fig_p005_5.png] view at source ↗
Figure 6
Figure 6. Figure 6: FIG. 6: Temperature dependent normalized [PITH_FULL_IMAGE:figures/full_fig_p005_6.png] view at source ↗
Figure 7
Figure 7. Figure 7: FIG. 7: a) Application of the deconvolution approach to the e [PITH_FULL_IMAGE:figures/full_fig_p007_7.png] view at source ↗
Figure 8
Figure 8. Figure 8: FIG. 8: Stability of the grown GaSe material in the cluster. a [PITH_FULL_IMAGE:figures/full_fig_p008_8.png] view at source ↗
read the original abstract

The large-area synthesis of high-crystalline-quality two-dimensional (2D) materials is at the core of novel material integration for semiconductor technology. This effort relies on developing fabrication and characterization techniques that can uncover the material's intrinsic properties by preserving its pristine conditions. In this article, we present an all ultra-high-vacuum cluster for the growth using molecular beam epitaxy of 2D semiconductors that are unstable under ambient conditions and optical spectroscopy using low temperature (20 K) photoluminescence and Raman scattering. The optical chamber of the setup provides micrometer scale spatial resolution and the ability to scan the entire wafer. The performance of its setup regarding spatial resolution, temperature control over a temperature range of 20-300 K using a closed-cycle cryostat and long-term preservation are demonstrated using as-grown post-transition metal monochalcogenides. Furthermore, we introduce a deconvolution-based algorithm to recover spatial information under vibration using a system-specific point-spread function. This enables in situ analysis of the structural and optoelectronic properties of as-grown materials in their pristine form, providing rich and reproducible feedback for both fundamental studies and the optimization of scalable 2D material growth toward integration in advanced devices.

Editorial analysis

A structured set of objections, weighed in public.

Desk editor's note, referee report, simulated authors' rebuttal, and a circularity audit. Tearing a paper down is the easy half of reading it; the pith above is the substance, this is the friction.

Referee Report

3 major / 2 minor

Summary. The manuscript describes an all-ultra-high-vacuum cluster tool integrating molecular beam epitaxy growth of air-unstable 2D semiconductors with in-situ low-temperature (20 K) photoluminescence and Raman spectroscopy. The optical chamber is claimed to deliver micrometer-scale spatial resolution with full-wafer scanning capability, closed-cycle cryostat temperature control from 20-300 K, and long-term sample preservation under UHV. A deconvolution algorithm employing a system-specific point-spread function is introduced to recover spatial information in the presence of vibrations. All performance aspects and the algorithm are demonstrated exclusively on as-grown post-transition metal monochalcogenides.

Significance. If the quantitative performance claims and artifact-free nature of the in-situ data hold, the instrument would provide a valuable platform for studying reactive 2D materials in their pristine state, enabling direct correlation between growth parameters and optoelectronic properties without ambient degradation. The vibration-robust deconvolution approach could be useful for other UHV optical setups. The narrow material scope of the demonstration, however, limits the immediate broader impact.

major comments (3)
  1. [Performance demonstration section] Performance demonstration section: All claims of micrometer-scale spatial resolution, temperature stability, and long-term preservation are shown exclusively on post-transition metal monochalcogenides; no data or examples from other reactive 2D families (e.g., certain TMDs or oxides) are provided to support generalization of the tool's utility.
  2. [Deconvolution algorithm description] Deconvolution algorithm description: The algorithm is introduced without quantitative metrics such as recovery accuracy, comparison to static reference images, or error analysis under controlled vibration amplitudes; this is central to the claim that it yields intrinsic spatial and optoelectronic information.
  3. [Optical spectroscopy results] Optical spectroscopy results: No direct quantitative comparison (peak positions, linewidths, intensities with error bars) between in-situ spectra and ex-situ measurements on the same samples is reported, leaving open the possibility of setup-induced artifacts (strain, residual gas, optical aberrations).
minor comments (2)
  1. [Abstract] Abstract: Performance claims are stated without accompanying numerical values, error bars, or specific resolution figures (e.g., achieved FWHM), reducing clarity for readers.
  2. [Methods/Experimental] Methods/Experimental: Specify the exact post-transition metal monochalcogenide compounds (e.g., SnSe, GaSe) and growth conditions used in the demonstration to aid reproducibility.

Simulated Author's Rebuttal

3 responses · 0 unresolved

We thank the referee for the positive assessment of the instrument's potential and for the constructive major comments. We address each point below and indicate the revisions we will make to the manuscript.

read point-by-point responses

  1. Referee: [Performance demonstration section] All claims of micrometer-scale spatial resolution, temperature stability, and long-term preservation are shown exclusively on post-transition metal monochalcogenides; no data or examples from other reactive 2D families (e.g., certain TMDs or oxides) are provided to support generalization of the tool's utility.

    Authors: The demonstrations are indeed performed on post-transition metal monochalcogenides as these materials exemplify the air-sensitive 2D semiconductors targeted by the tool. The cluster tool's capabilities—UHV environment, MBE growth, and in-situ optical access—are designed to be material-agnostic within the class of reactive 2D materials. To address the concern, we will revise the manuscript to include a dedicated paragraph discussing the generalization to other families, such as certain transition metal dichalcogenides or oxides, highlighting that the UHV conditions and optical setup do not depend on the specific material chemistry. We believe this clarifies the broader utility without requiring additional experimental data at this stage. revision: partial

  2. Referee: [Deconvolution algorithm description] The algorithm is introduced without quantitative metrics such as recovery accuracy, comparison to static reference images, or error analysis under controlled vibration amplitudes; this is central to the claim that it yields intrinsic spatial and optoelectronic information.

    Authors: We agree that a more rigorous quantitative evaluation of the deconvolution algorithm would strengthen the manuscript. In the revised version, we will add quantitative metrics including recovery accuracy (e.g., mean squared error or structural similarity index), comparisons to static reference images obtained under minimal vibration conditions, and an error analysis as a function of controlled vibration amplitudes. These additions will be incorporated into the section describing the algorithm and its performance. revision: yes

  3. Referee: [Optical spectroscopy results] No direct quantitative comparison (peak positions, linewidths, intensities with error bars) between in-situ spectra and ex-situ measurements on the same samples is reported, leaving open the possibility of setup-induced artifacts (strain, residual gas, optical aberrations).

    Authors: We note that direct ex-situ measurements on the identical samples are inherently difficult due to the rapid degradation of these reactive materials upon air exposure, which is precisely why the in-situ UHV approach is valuable. Nevertheless, to mitigate concerns about artifacts, we will include in the revision: (i) a quantitative comparison of our in-situ spectra with literature values for similar materials, including peak positions and linewidths with uncertainties; (ii) details on the UHV base pressure and residual gas analysis to rule out contamination; and (iii) an assessment of potential optical aberrations based on the system design. This will provide evidence that the spectra reflect intrinsic properties. revision: partial

Circularity Check

0 steps flagged

No circularity: purely experimental instrumentation with no derivations or fitted predictions

full rationale

The paper presents an all-UHV cluster tool for MBE growth and in-situ optical spectroscopy of reactive 2D materials. Performance claims (micrometer spatial resolution, 20-300 K control, long-term preservation, vibration-robust deconvolution) are demonstrated empirically on post-transition metal monochalcogenides using the physical setup itself. No equations, parameter fits, predictions, or self-citations appear in the derivation chain; the work contains no load-bearing steps that reduce to inputs by construction. The central claims rest on direct experimental observation rather than any self-referential logic.

Axiom & Free-Parameter Ledger

0 free parameters · 0 axioms · 0 invented entities

This is an experimental instrumentation paper. No free parameters, mathematical axioms, or invented physical entities are introduced in the abstract.

pith-pipeline@v0.9.0 · 5571 in / 1098 out tokens · 34722 ms · 2026-05-10T12:30:11.025244+00:00 · methodology

discussion (0)

Sign in with ORCID, Apple, or X to comment. Anyone can read and Pith papers without signing in.

Reference graph

Works this paper leans on

60 extracted references · 54 canonical work pages · 1 internal anchor

  1. [1]

    Cui , author Z

    author author Y. Cui , author Z. Zhou , author T. Li , author K. Wang , author J. Li , \ and\ author Z. Wei ,\ 10.1002/adfm.201900040 journal journal Advanced Functional Materials \ volume 29 ,\ pages 1900040 ( year 2019 ) NoStop

    work page doi:10.1002/adfm.201900040 2019

  2. [2]

    Long , author P

    author author M. Long , author P. Wang , author H. Fang , \ and\ author W. Hu ,\ 10.1002/adfm.201803807 journal journal Advanced Functional Materials \ volume 29 ,\ pages 1803807 ( year 2019 ) NoStop

    work page doi:10.1002/adfm.201803807 2019

  3. [3]

    Wang , author Y

    author author X. Wang , author Y. Sun , \ and\ author K. Liu ,\ 10.1088/2053-1583/ab20d6 journal journal 2D Materials \ volume 6 ,\ pages 042001 ( year 2019 ) NoStop

    work page doi:10.1088/2053-1583/ab20d6 2053

  4. [4]

    Han , author J

    author author X. Han , author J. Lin , author J. Liu , author N. Wang , \ and\ author D. Pan ,\ 10.1021/acs.jpcc.9b02549 journal journal The Journal of Physical Chemistry C \ volume 123 ,\ pages 14797 ( year 2019 ) NoStop

    work page doi:10.1021/acs.jpcc.9b02549 2019

  5. [5]

    author author K. S. \ Novoselov ,\ 10.1126/science.1102896 journal journal Science \ volume 306 ,\ pages 666 ( year 2004 ) NoStop

    work page internal anchor Pith review doi:10.1126/science.1102896 2004

  6. [6]

    author author K. F. \ Mak , author C. Lee , author J. Hone , author J. Shan , \ and\ author T. F. \ Heinz ,\ 10.1103/PhysRevLett.105.136805 journal journal Physical Review Letters \ volume 105 ,\ pages 136805 ( year 2010 ) NoStop

    work page doi:10.1103/physrevlett.105.136805 2010

  7. [7]

    Liu , author T

    author author C. Liu , author T. Liu , author Z. Zhang , author Z. Sun , author G. Zhang , author E. Wang , \ and\ author K. Liu ,\ 10.1038/s41565-024-01704-3 journal journal Nature Nanotechnology \ volume 19 ,\ pages 907 ( year 2024 ) NoStop

    work page doi:10.1038/s41565-024-01704-3 2024

  8. [8]

    Zallo , author A

    author author E. Zallo , author A. Pianetti , author A. S. \ Prikhodko , author S. Cecchi , author Y. S. \ Zaytseva , author A. Giuliani , author M. Kremser , author N. I. \ Borgardt , author J. J. \ Finley , author F. Arciprete , author M. Palummo , author O. Pulci , \ and\ author R. Calarco ,\ 10.1038/s41699-023-00390-4 journal journal npj 2D Materials ...

    work page doi:10.1038/s41699-023-00390-4 2023

  9. [9]

    Pianetti , author S

    author author A. Pianetti , author S. Cecchi , author M. Hanke , author J. J. \ Finley , author F. Arciprete , author R. Calarco , \ and\ author E. Zallo ,\ 10.1002/pssr.202500432 journal journal physica status solidi (RRL) – Rapid Research Letters \ ( year 2025 ),\ 10.1002/pssr.202500432 NoStop

    work page doi:10.1002/pssr.202500432 2025

  10. [10]

    , Chae , S.H

    author author D. Rhodes , author S. H. \ Chae , author R. Ribeiro-Palau , \ and\ author J. Hone ,\ 10.1038/s41563-019-0366-8 journal journal Nature Materials \ volume 18 ,\ pages 541 ( year 2019 ) NoStop

    work page doi:10.1038/s41563-019-0366-8 2019

  11. [11]

    Bissolo , author M

    author author M. Bissolo , author M. Hanke , author R. Calarco , author J. J. \ Finley , author G. Koblm\" u ller , author J. M. J. \ Lopes , \ and\ author E. Zallo ,\ 10.1002/smll.202503993 journal journal Small \ volume 21 ( year 2025 a ),\ 10.1002/smll.202503993 NoStop

    work page doi:10.1002/smll.202503993 2025

  12. [12]

    Cong , author X.-L

    author author X. Cong , author X.-L. \ Liu , author M.-L. \ Lin , \ and\ author P.-H. \ Tan ,\ 10.1038/s41699-020-0140-4 journal journal npj 2D Materials and Applications \ volume 4 ,\ pages 13 ( year 2020 ) NoStop

    work page doi:10.1038/s41699-020-0140-4 2020

  13. [13]

    Shree , author I

    author author S. Shree , author I. Paradisanos , author X. Marie , author C. Robert , \ and\ author B. Urbaszek ,\ 10.1038/s42254-020-00259-1 journal journal Nature Reviews Physics \ volume 3 ,\ pages 39 ( year 2021 ) NoStop

    work page doi:10.1038/s42254-020-00259-1 2021

  14. [14]

    Bradford , author B

    author author J. Bradford , author B. T. \ Dewes , author M. Shiffa , author N. D. \ Cottam , author K. Rahman , author T. S. \ Cheng , author S. V. \ Novikov , author O. Makarovsky , author J. N. \ O'Shea , author P. H. \ Beton , author S. Lara‐Avila , author J. Harknett , author M. T. \ Greenaway , \ and\ author A. Patanè ,\ 10.1002/smll.202404809 journ...

    work page doi:10.1002/smll.202404809 2024

  15. [15]

    Wang , author N

    author author W. Wang , author N. Clark , author M. Hamer , author A. Carl , author E. Tovari , author S. Sullivan-Allsop , author E. Tillotson , author Y. Gao , author H. De Latour , author F. Selles , author J. Howarth , author E. G. \ Castanon , author M. Zhou , author H. Bai , author X. Li , author A. Weston , author K. Watanabe , author T. Taniguchi ...

    work page doi:10.1038/s41928-023-01075-y 2023

  16. [16]

    author author K. P. \ Shchukin , author M. Hell , \ and\ author A. Gr\" u neis ,\ 10.1063/5.0242326 journal journal Review of Scientific Instruments \ volume 95 ( year 2024 ),\ 10.1063/5.0242326 NoStop

    work page doi:10.1063/5.0242326 2024

  17. [17]

    Bissolo , author M

    author author M. Bissolo , author M. Dembecki , author J. Belz , author J. Schabesberger , author M. Bergmann , author P. Avdienko , author F. Rauscher , author A. S. \ Ulhe , author H. Riedl , author K. Volz , author J. J. \ Finley , author E. Zallo , \ and\ author G. Koblm\" u ller ,\ 10.1038/s43246-025-01005-9 journal journal Communications Materials \...

    work page doi:10.1038/s43246-025-01005-9 2025

  18. [18]

    \ Liu , author J.-J

    author author C.-W. \ Liu , author J.-J. \ Dai , author S.-K. \ Wu , author N.-Q. \ Diep , author S.-H. \ Huynh , author T.-T. \ Mai , author H.-C. \ Wen , author C.-T. \ Yuan , author W.-C. \ Chou , author J.-L. \ Shen , \ and\ author H.-H. \ Luc ,\ 10.1038/s41598-020-69946-4 journal journal Scientific Reports \ volume 10 ,\ pages 12972 ( year 2020 ) NoStop

    work page doi:10.1038/s41598-020-69946-4 2020

  19. [19]

    Bissolo ,\ @noop title Electrically and optically active charge carrier traps in silicon-doped few-layer gase , \ ( year 2025 ) NoStop

    author author M. Bissolo ,\ @noop title Electrically and optically active charge carrier traps in silicon-doped few-layer gase , \ ( year 2025 ) NoStop

    2025

  20. [20]

    author author P. K. \ Chow , author R. B. \ Jacobs-Gedrim , author J. Gao , author T.-M. \ Lu , author B. Yu , author H. Terrones , \ and\ author N. Koratkar ,\ 10.1021/nn5073495 journal journal ACS Nano \ volume 9 ,\ pages 1520 ( year 2015 ) NoStop

    work page doi:10.1021/nn5073495 2015

  21. [21]

    author author T. H. \ Ly , author M.-H. \ Chiu , author M.-Y. \ Li , author J. Zhao , author D. J. \ Perello , author M. O. \ Cichocka , author H. M. \ Oh , author S. H. \ Chae , author H. Y. \ Jeong , author F. Yao , et al. ,\ @noop journal journal ACS nano \ volume 8 ,\ pages 11401 ( year 2014 ) NoStop

    2014

  22. [22]

    Rakhlin , author S

    author author M. Rakhlin , author S. Sorokin , author A. Galimov , author I. Eliseyev , author V. Davydov , author D. Kirilenko , author A. Toropov , \ and\ author T. Shubina ,\ @noop journal journal Nanoscale \ volume 16 ,\ pages 2039 ( year 2024 ) NoStop

    2039

  23. [23]

    author author L. V. \ Le , author T. T. T. \ Huong , author T.-T. \ Nguyen , author X. A. \ Nguyen , author T. H. \ Nguyen , author S. Cho , author Y. D. \ Kim , \ and\ author T. J. \ Kim ,\ 10.3390/cryst14060539 journal journal Crystals \ volume 14 ,\ pages 539 ( year 2024 ) NoStop

    work page doi:10.3390/cryst14060539 2024

  24. [24]

    author author N. T. \ Paylaga , author C.-T. \ Chou , author C.-C. \ Lin , author T. Taniguchi , author K. Watanabe , author R. Sankar , author Y.-h. \ Chan , author S.-Y. \ Chen , \ and\ author W.-H. \ Wang ,\ 10.1038/s41699-024-00450-3 journal journal npj 2D Materials and Applications \ volume 8 ,\ pages 12 ( year 2024 ) NoStop

    work page doi:10.1038/s41699-024-00450-3 2024

  25. [25]

    author author A. V. \ Lugovskoi , author M. I. \ Katsnelson , \ and\ author A. N. \ Rudenko ,\ 10.1103/physrevlett.123.176401 journal journal Physical Review Letters \ volume 123 ,\ pages 176401 ( year 2019 ) ,\ http://arxiv.org/abs/1907.08791 1907.08791 NoStop

    work page doi:10.1103/physrevlett.123.176401 2019

  26. [26]

    author author V. V. \ Zalamai , author N. N. \ Syrbu , author I. G. \ Stamov , \ and\ author S. I. \ Beril ,\ 10.1088/2040-8986/ab9f17 journal journal Journal of Optics \ volume 22 ,\ pages 085402 ( year 2020 ) NoStop

    work page doi:10.1088/2040-8986/ab9f17 2040

  27. [27]

    author author T. V. \ Shubina , author W. Desrat , author M. Moret , author A. Tiberj , author O. Briot , author V. Y. \ Davydov , author A. V. \ Platonov , author M. A. \ Semina , \ and\ author B. Gil ,\ 10.1038/s41467-019-11487-0 journal journal Nature Communications \ volume 10 ,\ pages 3479 ( year 2019 ) NoStop

    work page doi:10.1038/s41467-019-11487-0 2019

  28. [28]

    author author L. L. \ Murray , author M. P. \ Whalen , author A. Ishraq , author C. Maurtua , author M. Yu , author S. Law , author J. Xiao , author C. Chakraborty , \ and\ author M. Doty ,\ 10.1021/acsaom.5c00195 journal journal ACS Applied Optical Materials \ volume 3 ,\ pages 1757 ( year 2025 ) NoStop

    work page doi:10.1021/acsaom.5c00195 2025

  29. [29]

    Smiri , author R

    author author B. Smiri , author R. Bernardin , author M. Martin , author H. Roussel , author J. L. \ Deschanvres , author E. Nolot , author N. Rochat , author F. Bassani , author T. Baron , \ and\ author B. Pelissier ,\ 10.1016/j.mee.2024.112256 journal journal Microelectronic Engineering \ volume 294 ,\ pages 112256 ( year 2024 ) NoStop

    work page doi:10.1016/j.mee.2024.112256 2024

  30. [30]

    Bergeron , author J

    author author A. Bergeron , author J. Ibrahim , author R. Leonelli , \ and\ author S. Francoeur ,\ 10.1063/1.4986189 journal journal Applied Physics Letters \ volume 110 ,\ pages 241901 ( year 2017 ) ,\ http://arxiv.org/abs/1612.06907 1612.06907 NoStop

    work page doi:10.1063/1.4986189 2017

  31. [31]

    author author M. S. \ Claro , author J. P. \ Martínez‐Pastor , author A. Molina‐Sánchez , author K. E. \ Hajraoui , author J. Grzonka , author H. P. \ Adl , author D. F. \ Marrón , author P. J. \ Ferreira , author O. Bondarchuk , \ and\ author S. Sadewasser ,\ 10.1002/adfm.202211871 journal journal Advanced Functional Materials \ ,\ pages 2211871 ( year 2...

    work page doi:10.1002/adfm.202211871 2023

  32. [32]

    Shiffa , author B

    author author M. Shiffa , author B. T. \ Dewes , author J. Bradford , author N. D. \ Cottam , author T. S. \ Cheng , author C. J. \ Mellor , author O. Makarovskiy , author K. Rahman , author J. N. \ O'Shea , author P. H. \ Beton , author S. V. \ Novikov , author T. Ben , author D. Gonzalez , author J. Xie , author L. Zhang , \ and\ author A. Patanè ,\ 10....

    work page doi:10.1002/smll.202305865 2023

  33. [33]

    Osiekowicz , author D

    author author M. Osiekowicz , author D. Staszczuk , author K. Olkowska-Pucko , author . Kipczak , author M. Grzeszczyk , author M. Zinkiewicz , author K. Nogajewski , author Z. R. \ Kudrynskyi , author Z. D. \ Kovalyuk , author A. Patan \'e , author A. Babi \'n ski , \ and\ author M. R. \ Molas ,\ 10.1038/s41598-020-79411-x journal journal Scientific Repo...

    work page doi:10.1038/s41598-020-79411-x 2021

  34. [34]

    Yamada , author N

    author author A. Yamada , author N. Kojima , author K. Takahashi , author T. Okamoto , \ and\ author M. Konagai ,\ 10.1143/jjap.31.l186 journal journal Japanese Journal of Applied Physics \ volume 31 ,\ pages L186 ( year 1992 ) NoStop

    work page doi:10.1143/jjap.31.l186 1992

  35. [35]

    author author R. M. \ Hoff , author J. C. \ Irwin , \ and\ author R. M. A. \ Lieth ,\ 10.1139/p75-203 journal journal Canadian Journal of Physics \ volume 53 ,\ pages 1606 ( year 1975 ) NoStop

    work page doi:10.1139/p75-203 1975

  36. [36]

    Longuinhos \ and\ author J

    author author R. Longuinhos \ and\ author J. Ribeiro-Soares ,\ 10.1039/c6cp03806a journal journal Physical Chemistry Chemical Physics \ volume 18 ,\ pages 25401 ( year 2016 ) NoStop

    work page doi:10.1039/c6cp03806a 2016

  37. [37]

    author author M. R. \ Molas , author A. V. \ Tyurnina , author V. Zólyomi , author A. K. \ Ott , author D. J. \ Terry , author M. J. \ Hamer , author C. Yelgel , author A. Babiński , author A. G. \ Nasibulin , author A. C. \ Ferrari , author V. I. \ Fal’ko , \ and\ author R. Gorbachev ,\ 10.1039/d0fd00007h journal journal Faraday Discussions \ volume 227 ...

    work page doi:10.1039/d0fd00007h 2021

  38. [38]

    author author S. Y. \ Lim , author J.-U. \ Lee , author J. H. \ Kim , author L. Liang , author X. Kong , author T. T. H. \ Nguyen , author Z. Lee , author S. Cho , \ and\ author H. Cheong ,\ 10.1039/d0nr00165a journal journal Nanoscale \ volume 12 ,\ pages 8563 ( year 2020 ) ,\ http://arxiv.org/abs/2009.10954 2009.10954 NoStop

    work page doi:10.1039/d0nr00165a 2020

  39. [39]

    Dhuley ,\ 10.1016/j.cryogenics.2019.06.008 journal journal Cryogenics \ volume 101 ,\ pages 111 ( year 2019 ) NoStop

    author author R. Dhuley ,\ 10.1016/j.cryogenics.2019.06.008 journal journal Cryogenics \ volume 101 ,\ pages 111 ( year 2019 ) NoStop

    work page doi:10.1016/j.cryogenics.2019.06.008 2019

  40. [40]

    Salmon , author G

    author author K. Salmon , author G. Nellis , \ and\ author J. Pfotenhauer ,\ https://doi.org/10.1016/j.cryogenics.2022.103587 journal journal Cryogenics \ volume 128 ,\ pages 103587 ( year 2022 ) NoStop

    work page doi:10.1016/j.cryogenics.2022.103587 2022

  41. [41]

    Franta , author P

    author author D. Franta , author P. Franta , author J. Vohánka , author M. Čermák , \ and\ author I. Ohlídal ,\ 10.1063/1.5026195 journal journal Journal of Applied Physics \ volume 123 ,\ pages 185707 ( year 2018 ) NoStop

    work page doi:10.1063/1.5026195 2018

  42. [42]

    author author M. R. \ Querry ,\ @noop journal journal Contractor report \ ( year 1985 ) NoStop

    1985

  43. [43]

    author author C. J. \ Glassbrenner \ and\ author G. A. \ Slack ,\ @noop journal journal Physical review \ volume 134 ,\ pages A1058 ( year 1964 ) NoStop

    1964

  44. [44]

    author author Y. S. \ Touloukian , author R. W. \ Powell , author C. Y. \ Ho , \ and\ author P. G. \ Klemens ,\ https://www.osti.gov/biblio/5303523 title Thermophysical properties of matter - the tprc data series. volume 2. thermal conductivity - nonmetallic solids. (reannouncement). data book , \ type Tech. Rep. \ ( institution Purdue Univ., Lafayette, I...

    work page arXiv 1971

  45. [45]

    Franta , author D

    author author D. Franta , author D. Nečas , author I. Ohl \'i dal , \ and\ author A. Giglia ,\ in\ 10.1117/12.2227580 booktitle Optical Micro- and Nanometrology VI ,\ Vol.\ volume 9890 ,\ editor edited by\ editor C. Gorecki , editor A. K. \ Asundi , \ and\ editor W. Osten ,\ organization International Society for Optics and Photonics \ ( publisher SPIE ,\...

    work page doi:10.1117/12.2227580 2016

  46. [46]

    Ohtsuka , author T

    author author T. Ohtsuka , author T. Okamoto , author A. Yamada , \ and\ author M. Konagai ,\ 10.1016/s0022-2313(99)00319-1 journal journal Journal of Luminescence \ volume 87 ,\ pages 293 ( year 2000 ) NoStop

    work page doi:10.1016/s0022-2313(99)00319-1 2000

  47. [47]

    Lyu , author T

    author author D. Lyu , author T. Lin , author T. Chang , author S. Lan , author T. Yang , author C. Chiang , author C. Chen , \ and\ author H. Chiang ,\ 10.1016/j.jallcom.2010.03.130 journal journal Journal of Alloys and Compounds \ volume 499 ,\ pages 104 ( year 2010 ) NoStop

    work page doi:10.1016/j.jallcom.2010.03.130 2010

  48. [48]

    author author L. d. \ Brucker , author M. Moret , author B. Gil , \ and\ author W. Desrat ,\ 10.1103/physrevmaterials.6.064003 journal journal Physical Review Materials \ volume 6 ,\ pages 064003 ( year 2022 ) ,\ note model for FWHM broadening with temperature NoStop

    work page doi:10.1103/physrevmaterials.6.064003 2022

  49. [49]

    Castellanos-Gomez , author M

    author author A. Castellanos-Gomez , author M. Buscema , author R. Molenaar , author V. Singh , author L. Janssen , author H. S. J. v. d. \ Zant , \ and\ author G. A. \ Steele ,\ 10.1088/2053-1583/1/1/011002 journal journal 2D Materials \ volume 1 ,\ pages 011002 ( year 2014 ) NoStop

    work page doi:10.1088/2053-1583/1/1/011002 2053

  50. [50]

    Trotta , author E

    author author R. Trotta , author E. Zallo , author C. Ortix , author P. Atkinson , author J. D. \ Plumhof , author J. van den Brink , author A. Rastelli , \ and\ author O. G. \ Schmidt ,\ 10.1103/physrevlett.109.147401 journal journal Physical Review Letters \ volume 109 ( year 2012 ),\ 10.1103/physrevlett.109.147401 NoStop

    work page doi:10.1103/physrevlett.109.147401 2012

  51. [51]

    author author W. H. \ Richardson ,\ 10.1364/JOSA.62.000055 journal journal J. Opt. Soc. Am. \ volume 62 ,\ pages 55 ( year 1972 ) NoStop

    work page doi:10.1364/josa.62.000055 1972

  52. [52]

    author author L. B. \ Lucy ,\ 10.1086/111605 journal journal The Astronomical Journal \ volume 79 ,\ pages 745 ( year 1974 ) NoStop

    work page doi:10.1086/111605 1974

  53. [53]

    Dey , author L

    author author N. Dey , author L. Blanc-F \'e raud , author C. Zimmer , author P. Roux , author Z. Kam , author J.-C. \ Olivo-Marin , \ and\ author J. Zerubia ,\ https://inria.hal.science/inria-00070726 title 3D Microscopy Deconvolution using Richardson-Lucy Algorithm with Total Variation Regularization , \ type Research Report \ number RR-5272 \ ( institu...

    2004

  54. [54]

    Liu , author J

    author author J. Liu , author J. Li , author L. Gu , author H. Wu , author G. Han , author D. Wang , author J. Zhou , author X. Gong , author D. Yang , author S. Zheng , author D. Zhang , author B. Zhang , \ and\ author X. Zhou ,\ 10.1016/j.apsusc.2022.152774 journal journal Applied Surface Science \ volume 586 ,\ pages 152774 ( year 2022 ) NoStop

    work page doi:10.1016/j.apsusc.2022.152774 2022

  55. [55]

    \ Hong , author Y.-X

    author author T.-J. \ Hong , author Y.-X. \ Chen , author N. N. \ Quyen , author Y.-H. \ Chen , author C.-H. \ Chen , author B.-H. \ Huang , author J.-Y. \ Chen , author M.-S. \ Ho , author J.-Y. \ Juang , author C.-H. \ Chen , \ and\ author C.-W. \ Luo ,\ 10.1021/acsaelm.2c00468 journal journal ACS Applied Electronic Materials \ volume 4 ,\ pages 3049 ( ...

    work page doi:10.1021/acsaelm.2c00468 2022

  56. [56]

    author author B. M. \ Kowalski , author N. Manz , author D. Bethke , author E. A. \ Shaner , author A. Serov , \ and\ author N. G. \ Kalugin ,\ 10.1088/2053-1591/ab1dd2 journal journal Materials Research Express \ volume 6 ,\ pages 085907 ( year 2019 ) NoStop

    work page doi:10.1088/2053-1591/ab1dd2 2053

  57. [57]

    Zhao , author R

    author author Q. Zhao , author R. Frisenda , author P. Gant , author D. P. d. \ Lara , author C. Munuera , author M. Garcia‐Hernandez , author Y. Niu , author T. Wang , author W. Jie , \ and\ author A. Castellanos‐Gomez ,\ 10.1002/adfm.201805304 journal journal Advanced Functional Materials \ volume 28 ,\ pages 1805304 ( year 2018 ) ,\ http://arxiv.org/ab...

    work page doi:10.1002/adfm.201805304 2018

  58. [58]

    author author O. D. \ Pozo-Zamudio , author S. Schwarz , author J. Klein , author R. C. \ Schofield , author E. A. \ Chekhovich , author O. Ceylan , author E. Margapoti , author A. I. \ Dmitriev , author G. V. \ Lashkarev , author D. N. \ Borisenko , author N. N. \ Kolesnikov , author J. J. \ Finley , \ and\ author A. I. \ Tartakovskii ,\ https://arxiv.or...

    work page arXiv 2015

  59. [59]

    Thapa , author B

    author author J. Thapa , author B. Liu , author S. D. \ Woodruff , author B. T. \ Chorpening , \ and\ author M. P. \ Buric ,\ 10.1364/ao.56.008598 journal journal Applied Optics \ volume 56 ,\ pages 8598 ( year 2017 ) NoStop

    work page doi:10.1364/ao.56.008598 2017

  60. [60]

    Kadleı́ková , author J

    author author M. Kadleı́ková , author J. Breza , \ and\ author M. Veselý ,\ 10.1016/s0026-2692(01)00087-8 journal journal Microelectronics Journal \ volume 32 ,\ pages 955 ( year 2001 ) NoStop

    work page doi:10.1016/s0026-2692(01)00087-8 2001