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arxiv: 2012.10019 · v2 · pith:57WTZLPU · submitted 2020-12-18 · cond-mat.mtrl-sci · cond-mat.mes-hall· cond-mat.str-el· physics.app-ph

A CMOS Compatible Aluminum Scandium Nitride-based Ferroelectric Tunnel Junction Memristor

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classification cond-mat.mtrl-sci cond-mat.mes-hallcond-mat.str-elphysics.app-ph
keywords ferroelectricaluminumcmoscompatiblejunctionmemristorscandiumtunnel
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We report a complementary metal oxide semiconductor (CMOS) technology compatible ferroelectric tunnel junction memristor grown directly on top of a Silicon substrate using a scandium doped aluminum nitride as the ferroelectric layer.

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