Not yet reviewed by Pith; the record is open.

Early results on the plasma deposition of dielectric thin films on acoustic wave (AW) activated substrates revealed a densification pattern arisen from the focusing of plasma ions and their impact on specific areas of the piezoelectric substrate. Herein, we extend this methodology to tailor the plasma deposition of metals onto AW-activated LiNbO3 piezoelectric substrates. Our investigation reveals the tracking of the initial stages of nanoparticle (NP) formation and growth during the submonolayer deposition of silver. We elucidate the specific role of AW activation in reducing particle size, enhancing particle circularity, and retarding NP agglomeration and account for the physical phenomena making these processes differ from those occurring on non-activated substrates. We provide a comparative analysis of the results obtained under two representative plasma conditions: diode DC sputtering and magnetron sputtering. In the latter case, the AW activation gives rise to a 2D pattern of domains with different amounts of silver and a distinct size and circularity for the silver NPs. This difference was attributed to the specific characteristics of the plasma sheath formed onto the substrate in each case. The possibilities of tuning the plasmon resonance absorption of silver NPs by AW activation of the sputtering deposition process are discussed.